About NT-MDT. To know more about us and our products you are welcome to Victor A. Bykov President, NT-MDT Co.

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2 About NT-MDT Our mission: NT-MDT is the innovation company which develops and promotes Scanning Probe technologies to various fields of science, production and education world wide We are living in a surprisingly favorable time for development of nanotechnology. Penetration into the world of small sizes has never been that vital for so many areas and directions in the science and industry. And today the demand for reliable, precise and multipurpose devices, capable to work in a scale of sizes comparable to the sizes of single atoms, is great like never before. NT-MDT company has been creating the equipment for nanotechnology researches for more than 15 years, steadily holding the advanced positions regaring the quality standards, hi-tech developments and original technical solutions. The range of our products constantly expands, and is represented today with different equipment lines. These are the accessories and supplies for the probe microscopy; simple SPMs for educational needs; multipurpose and specialized SPMs for scientific and industrial (nanotechnology) research centers. These are the multipurpose probe nano-laboratories uniting the whole spectrum of modern techniques on the SPM basis, and allowing to carry out researches on a joint of achievements in several fundamental scientific areas instantly; and, at last, the modular nano-factories uniting the whole arsenal of means and techniques necessary for creation, processing and quality assurance of devices and elements of micro- and nano-electronics. Service consulting of our users and maintenance of working systems are carried out by experts in more than 20 representative offices and distributor centers worldwide. Two branch offices of the company were opened in Holland and America in 2000 and For the period of the number of people and organizations, which have chosen our products, has increased in more than 5 times! It is very important for us to realize, that our devices can really promote the development of your laboratory or a research and technology center. We hope that working on our equipment, which incorporates advanced hi-tech achievements, will be pleasant for you and fruitful for achievement of success in your scientific activities. To know more about us and our products you are welcome to Victor A. Bykov President, NT-MDT Co. Copyright NT-MDT,

3 Contents Scanning probe microscopy in general Educational SPM system Standard class systems Professional SPM systems Professional specialized SPM systems STM AFM SNOM NanoEducator Solver P47-PRO SMENA Solver P47H-PRO Solver PRO Solver PRO-M Solver MFM Solver EC Solver BIO-M Solver SNOM Solver LS Solver HV Solver CRYO Copyright NT-MDT, 2005

4 Controller Software SPM related products Important features Measuring heads and scanners Scanning stage Adjustment units Legs Positioning systems Liquid cells Heating stages Approach systems Vibration and acoustic isolation systems Holders and frames Chambers, vacuum options Special devices EC options Optical systems Laser modules Spectrometers PMT modules Reflection mode modules Electronics Interface cards Workstations Software Cables Toolkits Contents Other instrumentation lines Short glossary Accessories Probe Nano Laboratory Probe Nano Factory Probes Test samples Copyright NT-MDT,

5 Scanning probe microscopy in general Three basic SPM (Scanning Probe Proximity Microscopy*) techniques are classified by the type of the probe used and by the nature of probe sample interaction occurring in close proximity of the sample surface: Scanning Tunneling Microscopy (STM) the probe is a sharp metal tip that conducts tunnel current occurring between the tip and the conductive surface; the tunnel current strong dependence on the tip-surface distance lies in the base of imaging. Atomic Force Microscopy (AFM) the probe is a sharp tip (sometimes with coating) protruding from a free end of a long flat cantilever. The probe scans the sample surface and tip-sample interaction forces cause cantilever bending. In other words, AFM probe is the reminiscence of an old gramophone needle feeling the roughness of the sound track. Scanning Near Field Optical Microscopy (SNOM) the probe is a sharp tip of an optical fiber put to the surface close enough to provide near-field effects. Fiber conducted light, which is passing through a sub-wave aperture, forms an image free of far-field optics limitations. * The abbreviation SPPM (Scanning Probe Proximity Microscopy) is often used to discriminate between the beam probe devices, e.g. electron microscopes, and proximity probe devices, e.g. AFMs 4 Copyright NT-MDT, 2005

6 STM Scanning probe microscopy in general In Scanning Tunneling Microscopy (STM) bias voltage is applied between a sharp conductive tip and a conductive sample, so when the sample is approached to a few angstroms to the tip, tunneling current occurs, which indicates proximity of the tip to the sample with very high accuracy. In Constant Current mode of operation the scanner maintains the current constant by feedback circuit while scanning the sample surface. So vertical displacement of the scanner (feedback signal) reflects the surface topography. STM provides true atomic resolution on some samples even at ambient conditions. Scanning tunneling microscopy can be applied to study conductive surfaces or thin nonconductive films and small objects deposited on conductive substrates. The scanning rate in the Constant Current Mode is restricted by the use of feedback system. Larger scanning speeds can be obtained with Constant Height Mode, but the Constant Current Mode allows investigation of the samples with a higher topography. The tunnel current registered while the measurement is quite small up to 0.03 na (with a special STM head up to 0.01 na), so it is possible to investigate low conductive surfaces as well, in particular the biological objects. Among the STM disadvantages one can mention the complexity of the results interpretation for some surfaces since the surface image received in the STM mode is determined not only by the surface topography but also by the density of states, bias voltage sign and value, current value etc. For example, on the highly oriented pyrolitic graphite (HOPG) surface one can see only one of two atoms. The reason is the special arrangement of wave function density of states. References: Rep. Prog. Phys. 55, (1992) Copyright NT-MDT,

7 Scanning probe microscopy in general AFM Despite of the great success of the Scanning Tunneling Microscopy, it was obvious that STM has one fundamental disadvantage using STM, it is possible to investigate only the samples, which are conductive or coated by conductive layers. This disadvantage was overcome due to the invention of Atomic Force Microscope by Binnig [1]. Many methods were used for the registration of a cantilever bending, but currently the most widely used is a method invented by Amer and Meyer [2]. According to them an atomic force microscope includes a tip mounted on a micromachined cantilever. As the tip scans a surface to be investigated, inter-atomic forces between the tip and the sample surface induce displacement of the tip and corresponding bending of the cantilever. The AFM head uses a beam deflection scheme to monitor the cantilever displacement. This scheme is quite simple and permits registration of both normal deflection of the cantilever with sub-angstrom resolution and its twisting angle, so normal and lateral forces can be measured simultaneously. A semiconductor laser is used as a source of light. A laser beam is focused onto the back surface of the cantilever close to the tip position, and reflected beam falls onto the quadrant photodiode. Cantilever deflection causes displacement of the reflected beam over sections of the photodiode. Cantilever can be bent not only by the direct contact forces under the tip-sample surface interaction, but also by far-ranging forces: van der Waals, magnetic, electric etc. Cantilever can be forced to oscillations during the scanning process as firstly Binnig [1] proposed. Oscillations can proceed while the tip remains in direct contact with the sample surface, without touching the surface by the tip and with contacts occurring periodically between the tip and the surface (semi-contact or intermittent-contact modes). Scanning can be performed in several passes, with each subsequent pass providing additional information about the sample surface. All these capabilities generate many techniques and modes of AFM operation. Scanning-by-sample and scanning-by-probe configurations Two different schemes of scanning probe microscope operation are usually exploited. One is the so-called scanning-by-sample scheme when the piezoscanner drives the sample while the probe remains motionless. This scheme provides the highest spatial resolution of scanning due to the stability of the registration system producing minimal parasitic noise and the mechanical rigidity of the tip-sample system provided by the measuring unit special design. The scheme has one drawback it places limitations on the size and the weight of a sample to be measured, since large and massive samples placed on the piezoscanner result in movements being rough and of worse precision. To overcome this limitation the scanning-by-probe scheme has been developed. The sample is static and the piezoscanner drives the probe. The registration system becomes moving along with the probe. This scheme allows scanning massive samples with bigger size. In some cases this is the only possible solution, e.g. when a big sample has to be studied or the AFM device should be mounted on an inverted optical microscope, as required for many biological applications, or when it is necessary to measure samples with unlimited size when the measuring head is used as a stand alone device. References: 1. US Pat US Pat. RE37,299 (Reissued Pat. No. 5,144,833) 6 Copyright NT-MDT, 2005

8 SNOM Scanning probe microscopy in general The resolving power of classic optical microscopes is restricted by Abbe's diffraction limit to about one-half of the optical wavelength. However, it is possible to overcome this limit. If a sub wavelength hole (e.g. that in a metal sheet) is scanned in a close proximity of an object, a super-resolved image can be built up from the detected light that passes through the hole. Scanning near-field microscopy based on this principle was first proposed by Synge [1] in 1928 and demonstrated at microwave frequencies by Ash and Nicholls [2] in 1972 with a resolution of λ/60. At visible wavelengths this principle (optical stethoscopy, near-field optical-scanning microscopy, SNOM) was demonstrated by Pohl et al [3,4]. In [5] Betzig et al have demonstrated the imaging of a variety of samples with a number of different contrast mechanisms using fiber probes. To make the system easier to use and to extend its applicability to the samples of arbitrary topography, it was necessary to have a distance regulation mechanism capable to automate the initial approach and maintain the aperture at a fixed distance from the sample. Several mechanisms have been proposed previously to SNOM and related evanescent field techniques, including electron tunneling, capacitance, photon tunneling, near-field reflection. Now the mostly used method of tip-sample distance regulation relies on the detection of shear forces between the end of the near-field tip and the sample [5]. Shear Force based system allows Shear Force imaging to be performed separately or simultaneously Shear Force and Near-Field imaging, including Transmission mode for transparent samples, Reflection mode for opaque samples and Luminescence mode for additional characterization of samples. References: 1. Philos. Mag. 6, 356 (1928). 2. Nature (London) 237, 510 (1972). 3. Appl. Phys. Lett. 44, 651 (1984). 5. J. Appl. Phys. 59, 3318 (1986). 5. Appl. Phys. Lett. 60, 2484 (1992). Copyright NT-MDT,

9 Scanning probe microscopy in general Thus it is obvious that the scanning probe microscopy becomes a universal tool to be exploited in all sciences and almost all industries. Design solutions apparently should vary for different aims and purposes. NT-MDT offers the full range of SPM based systems from very simple ones serving as educational modules for students training to sophisticated scientific systems adopted for profound object investigation in such extreme conditions as near-to-zero temperature, high vacuum or heating up to 420 K. Other specialized systems have been developed to support experiments in chemistry, biology, and medicine. There are several factors that provide NT-MDT instrumentation perfect quality. great attention to use the materials fitting the whole device functioning perfectly. Titanium, gold, platinum, sapphire, new millennium plastics this is only a part of entire list of materials that NT-MDT microscopes and their parts are made of. The suitability always goes above the material cost. For example, many parts of Solver line microscopes have been made of titanium to be correlated with piezoceramics since titanium has the closest to ceramics thermal expansion factor. Moreover, low weight and good corrosion properties make titanium very good material for the SPMs building. It is important for microscope parts to be non-magnetic in investigations of magnetic properties. In this case gold and platinum become the best choice when perfect electrical contact is required. The most important is that the SPM Research & Development is the main concern of the NT-MDT. Based on Soviet Union science and technology, NT-MDT received a significant impulse by recruiting the best staff from hi-tech departments (e.g. from microelectronics and space industry). Now the best world-known Russian universities are involved in new-generation team formation. The feed-back information constantly obtained from current customers is the source of inspiration for many improvements that each SPM model undergoes. That is why even simple and economy models provide surprising imaging quality. Materials used for Solver SPMs provide the factor influencing image quality that one usually does not realize. NT-MDT pays Another part of the strategy aimed to make the best quality up to date is to purchase components and supplementary parts from the best manufacturers. Electronics active components, lasers, optical microscopes, anti-vibration systems, all these parts are out of NT-MDT specialization but they can be essential in some system configurations. Such companies as Burr Brown, Analog Devices, Melles Griot, Nikon, Olympus, Halcyonics, JRS Scientific Instruments are involved in complex measuring instruments formation. Very important feature is that NT-MDT software is designed to control all components being used. Thus NT-MDT offers the most comprehensive SPMs of great quality for a wide range of applications in almost all areas of science. 8 Copyright NT-MDT, 2005

10 Educational SPM system The simplest SPM perfectly designed to meet an educational laboratory needs. NanoEducator Copyright NT-MDT,

11 NanoEducator Educational SPM system Description NanoEducator has been developed to meet the demands of educational centers universities, colleges, institutes with tutoring facilities and so on. This is very compact and extremely easy-to-use SPM supplied with all information and materials as required to begin the study. The SPM basis handbook enclosed in the package makes the training to be comprehensive and fundamental. The built-in animated computer based training course drives the SPM mastering step by step and technique by technique. It includes: determination of the main parameters of the universal tunneling current sensor and SPM force interactions determination of the SPM scanner parameters SPM visualization of solid state micro- and nanostructures dynamic force lithography surface modification tool SPM data processing and quantitative analysis scanning probe microscopy of bacterial cells processing (plane subtraction, derivatives, medium filters) and quantitative data analysis (surface roughness (Ra, Rq), thickness and distance measurements, geometrical analysis) are available. Applications Biology (cells, viruses, bacteria, tissues) Inspection of parts made using MEMS technology Data storage devices (data storage media inspection) Micro- and nanostructures (gratings, self-organizing systems) Materials science (metals, semiconductors, dielectrics, composition materials, polymers) Operation modes AFM Semicontact modes: Phase imaging/ Force spectroscopy; Operation in liquids (in a drop). Probe operation is very easy replacement requires no complicated adjustment, hand made probes are fully acceptable. Additional set up allows recovery of a damaged probe. As soon as the system does not require expensive consumed materials the training process becomes very economic. A kit of the most popular samples is supplied. Windows 95/98/2000/XP compatible software of the NanoEducator is designed to provide full hardware control. In addition to 2D and 3D scan viewing mathematical image AFM lithography Dynamic plowing lithography (force) STM Topography imaging (constant current mode)/ Differential contrast (modulation in X-Y plane)/ Current imaging (constant height mode)/ Work function measurements (Z modulation)/ Tunnel spectroscopy (di/dv measurements)/ Operation in dielectric liquids (in a drop) Specifications Sample size diameter up to 12 mm, thickness up to 3 mm Scan range 70x70x10 µm (+/-10%) Scanner nonlinearity 2% Min. scanning step 1 Å Max. scan points 1024x1024 (max. RAM 64 MB) STM current range 100 pa 200 na Resolution AFM mode X-Y 10 nm, Z 3 nm STM mode X-Y 10 nm, Z 2 nm Probe characteristics Material D 100 µm Tip curvature radius 100 nm Tip cone angle Tip sharpening availability up to 10 nm Probe is grounded Optical system CCD camera for visual tip approach control Compatibility with long-focus optical microscope Scanning by sample 10 Copyright NT-MDT, 2005

12 Standard class systems Solver P47-PRO The simple and reliable Scanning Probe Microscope for routine surface analysis. Sample size is limited in this model for the sake of high resolution. SMENA The simple and compact SPM for stand alone analysis of samples with unlimited sizes. Solver P47H-PRO The simple and reliable Scanning Probe Microscope for routine surface analysis. It is especially adopted for the analysis of large and heavy samples. Copyright NT-MDT,

13 Standard class systems Solver P47-PRO Description The Solver P47-PRO SPM is a universal tool for the complex research of different objects in air, liquid and controlled gas environments with sample heating up to 130 C. Scanning-by-sample scheme realized in the microscope provides the highest resolution in the class. Time-proven technical solutions are the base for high reliability and measurement accuracy. The construction makes the work with the system pleasant and easy. It can be used for routine measurements in small companies and university laboratories as well as in big research centers. Applications Materials science Nanolithographies & nanomanipulations Medicine & biology Semiconductors Thin films Operation modes Microscopies: in air: STM/ Atomic Force Microscopy (AFM) (contact + semicontact + noncontact)/ Lateral Force Microscopy (LFM)/ Phase Imaging mode/ Force Modulation mode/ Adhesion Force Imaging/DC & AC Magnetic Force Microscopy (MFM) / DC & AC Electrostatic Force Microscopy (EFM)/ Scanning Capacitance Microscopy (SCM)/ Kelvin Probe Microscopy (KPM)/ Spreading Resistance Imaging (SRI) in liquid: Atomic Force Microscopy (AFM) (contact + semicontact + non-contact)/ Lateral Force Microscopy (LFM)/ Phase Imaging mode/ Force Modulation mode/ Adhesion Force Imaging. Spectroscopies: AFM (force-volume imaging, amplitude-distance, phase-distance curves), STM (I(z), I(V), Local Barrier Height (LBH), Local Density of States (LDOS). Lithographies: in air: AFM (Force (scratching + dynamic plowing) and Current (DC & AC ))/ STM; in liquid: AFM (scratching + dynamic plowing). Nano-manipulations: Contact Force 12 Copyright NT-MDT, 2005

14 Solver P47-PRO Specifications Sample Size Scanners Min. Scanning Step Scanning Type SPM Heads Optical Viewing system Vibration Isolation 40x40x10 mm 3x3x1.3 µm (±10%); 10x10x2 µm (±10%); 50x50x3 µm (±10%) nm; nm; nm By Sample AFM STM: 30 pa 50 na, RMS noise 4 pa (standard preamplifier), 10 pa 5 na, RMS noise 1.5 pa (low current preamplifier) Resolution 3 µm Numerical aperture 0.1 Magnification 48x to 578x Horizontal field of view 6.1 to 0.49 mm Passive isolation is integrated Active anti-vibration system is available by request Standard class systems Components Measuring heads SF002, ST005, ST006, SC103, SC110, SC150, & scanners SFC050, SFC050SEMI, SFC100, SFC100SEMI, SNC100, SFC050L, SFC100L, CH01L, AD001 Adjustment units AU006, AU007, AU028 Legs LG001, LG006 Liquid cells MP3LC Heating stages SU003 Approach systems SCB02A Vibration and acoustic AC004, DBM01 isolation systems Special devices AFAM03, XYZ01 Optical systems CCD03o, ССBC1, ССBM1, TR003 Electronics BL022MT, BL0XYZ Interface cards IN004, IN005 Software SWD01, SWD02, SWD05 Cables CE002, IC001 Toolkits SU001, SU002, SU007, SU008, SU015 Copyright NT-MDT,

15 Standard class systems SMENA Description Stand Alone SMENA expands the scope of SPM to bring you innovative facilities for the investigation of samples with unlimited size in most available SPM measuring modes. In spite of such versatile measuring capabilities, Stand Alone SMENA has a very compact low weight design and reasonable price. SPM SMENA consists of a stand-alone measuring head and an electronic module connected to a laptop or a PC by means of an interface board. This nice compact and portable device driven by a notebook will help to reveal nano-scale properties of any large objects even outdoors. When the sample size is limited to 100x100x20 cm it is possible to use SMENA with the positioning stage. That brings the possibility to fix the sample on the magnet holder and position the tip over the sample surface in the range of 5x5 mm with 5 µm resolution. SMENA is easily mounted on an inverted optical microscope within Solver BIO-M or Solver SNOM models. It is also easy to upgrade SMENA to Solver P47H-PRO system. Applications Operation modes Microscopies: in air: Atomic Force Microscopy (AFM) (contact + semicontact + noncontact)/ Lateral Force Microscopy (LFM)/ Phase Imaging mode/ Force Modulation mode/ Adhesion Force Imaging/DC&AC Magnetic Force Microscopy (MFM) / DC&AC Electrostatic Force Microscopy (EFM)/ Scanning Capacitance Microscopy (SCM)/ Kelvin Probe Microscopy (KPM)/ Spreading Resistance Imaging (SRI) in liquid: Atomic Force Microscopy (AFM) (contact + semicontact + non-contact)/ Lateral Force Microscopy (LFM)/ Phase Imaging mode/ Force Modulation mode/ Adhesion Force Imaging. Spectroscopies: AFM (force-volume imaging, amplitude-distance, phase-distance curves). Lithographies: in air: AFM (Force (scratching + dynamic plowing) and Current (DC&AC ); in liquid: AFM (scratching + dynamic plowing). Nano-manipulations: Contact Force Coating and polishing quality control Optical and magnetic storage Large optics Semiconductors Any areas where object surface is too spacious to apply conventional SPM 14 Copyright NT-MDT, 2005

16 SMENA Specifications Sample Size Scanners Min. Scanning Step Scan Type Sample positioning range Positioning resolution Optical viewing system Vibration Isolation Unlimited. Small samples (up to 100x100x20mm) can be placed between the SMENA head legs. 50x50x2.5 µm (±10%); 100x100x5 µm (±10%) nm; nm By Probe 5x5 mm 5 µm Resolution 3 µm Numerical aperture 0.1 Magnification 48x to 578x Horizontal field of view 2 to 0.49 mm Passive vibration isolation is available by request Active anti-vibration system is available by request Standard class systems Components Measuring heads SFC050, SFC050SEMI, SFC100, SFC100SEMI, SNC100, SNLG100, SFC050L, SFC100L, CH01L Legs LG001, LG003, LG006 Liquid cells MP1LC Positioning systems MP1SM Approach systems SCB02A, LGM01, LGM04 Vibration and acoustic DBM01, DBM03, MOD-1 M+, TS -150, BM-1 isolation systems Special devices XYZ01 Optical systems CCD03o, ССBC1, ССBM1, MA001, TR003 Electronics BL022MT, BL0XYZ Interface cards IN004, IN005 Software SWD01, SWD02, SWD05 Cables CE002, IC001 Toolkits SU001, SU007, SU015 Copyright NT-MDT,

17 Standard class systems Solver P47H-PRO Description SPM Solver P47H-PRO features its versatility. The number of available measurement and influence methods and modes is huge. Scanning-by-probe scheme allows characterization of samples with sizes up to 100x100x20mm and weight 300 g. The letter H in the model name means head-associated scanning. The model can be adopted for measurements in a controlled gas environment, in liquids, with sample heating up to 130 C. The AFM head can be easily removed for Stand Alone operation allowing samples with unlimited sizes to be measured. Applications Materials Science Semiconductors Optical and magnetic storage development Thin films Medicine & biology Polymers Operation modes Microscopies: in air: STM/ Atomic Force Microscopy (AFM) (contact + semicontact + noncontact)/ Lateral Force Microscopy (LFM)/ Phase Imaging mode/ Force Modulation mode/ Adhesion Force Imaging/DC&AC Magnetic Force Microscopy (MFM) / DC&AC Electrostatic Force Microscopy (EFM)/ Scanning Capacitance Microscopy (SCM)/ Kelvin Probe Microscopy (KPM)/ Spreading Resistance Imaging (SRI)/AFAM in liquid: Atomic Force Microscopy (AFM) (contact + semicontact + non-contact)/ Lateral Force Microscopy (LFM)/ Phase Imaging mode/ Force Modulation mode/ Adhesion Force Imaging. Spectroscopies: AFM (force-volume imaging, amplitude-distance, phase-distance curves), STM (I(z), I(V), Local Barrier Height (LBH), Local Density of States (LDOS). Lithographies: in air: AFM (Force (scratching + dynamic plowing) and Current (DC&AC ))/ STM; in liquid: AFM (scratching + dynamic plowing). Nano-manipulations: Contact Force. 16 Copyright NT-MDT, 2005

18 Solver P47H-PRO Specifications Sample size Scanners Min. Scanning Step Scan Type SPM Heads Optical viewing system Vibration Isolation 100x100x20 mm 50x50x2.5 µm (±10%); 100x100x5 µm (±10%); 100x100x3.5 µm (±10%) (for Shear Force only) nm; nm; nm By Probe AFM; STM: 30 pa 50 na, RMS noise 4 pa; Shear Force Resolution 3 µm Numerical aperture 0.1 Magnification 48x to 578x Horizontal field of view 2 to 0.49 mm Passive isolation is integrated Active anti-vibration system is available by request Standard class systems Components Measuring heads SFC050, SFC050SEMI, SFC100, SFC100SEMI, & scanners SNC100, SNLG100, SFC050L, SFC100L, CH01L, AD001, SF002, ST005, ST006, SC103, SC110, SC150 Adjustment units AU006, AU007, AU028 Legs LG001, LG006 Liquid cells MP3LC Approach systems SCB02A Vibration and acoustic AC004, DBM01 isolation systems Special devices AFAM03, XYZ01 Optical systems CCD03o, ССBC1, ССBM1, TR003 Electronics BL022MT, BL0XYZ Interface cards IN004, IN005 Software SWD01, SWD02, SWD05 Cables CE002, IC001 Toolkits SU003, SU001, SU007, SU008, SU015 Copyright NT-MDT,

19 Professional SPM systems Solver PRO The universal platform for the modern and powerful research grade SPMs. It has been developed to use the latest technological know-how in the field of scanning probe microscopy. This unique instrument opens up new horizons for the thorough investigation of different kinds of samples, delivering resolutions on the atomic/molecular scale in air, gas and liquid environments as well as the opportunity to use almost any known scanning probe microscopy technique. Solver PRO-M The newest development of the Solver PRO platform. Powerful controller, sensor-based closed-loop operation and 1 µm optics are the most important tips. 18 Copyright NT-MDT, 2005

20 Solver PRO Professional SPM systems Description Solver PRO is a powerful instrument for investigation of new materials, thin films, polymers, semiconductors, biological samples and for any other applications which require atomic or molecular resolution in air, gas or fluid environments, as well as in-situ examination of structural changing on the sample surface during heating. The modular system design is unique, because it allows configuring the instrument for any application. For instance, the original construction of the Solver PRO base unit provides a simple procedure of scanners replacement, set up of the sample holder, AFAM module, heating stages and so on, depending on the experimental requirements. Due to the base unit construction it is possible to mount any type of atomic force (AFM), scanning tunneling (STM) and shear force (SNOM) measuring heads. The scanning range may vary from 1.3 to 15 microns along Z direction, and from 3 to 150 microns along XY. The integrated optical viewing system has an optical resolution of 3 um and makes it much easier to adjust the laser beam, to choose a surface area for examination and to monitor the scanning process on the screen. The adjustable stand of the optical system makes it possible to exchange the measuring heads and samples and get the optical image of the same area without any additional adjustment of the optics. Hence, the Solver PRO brings together the whole series of scanning probe microscopes in a single platform, providing all of the major SPM techniques. Its state-of-the-art design and powerful software, which can be easily set up for any measuring technique will substantially reduce the time required to thoroughly examine the sample and obtain full and accurate information about the sample properties. Copyright NT-MDT,

21 Solver PRO Professional SPM systems Applications Material sciences (polymers, semiconductors etc.) Biological sciences Any applications which require atomic or molecular resolution in air, gas or fluid environments, as well as in-situ examination of structural changing on the sample surface during heating. Operation modes (KPM)/ Spreading Resistance Imaging (SRI)/ Atomic Force Acoustic Microscopy (AFAM); in liquid: Atomic Force Microscopy (AFM) (contact + semicontact + non-contact)/ Lateral Force Microscopy (LFM)/ Phase Imaging mode/ Force Modulation mode/ Adhesion Force Imaging. Spectroscopies: AFM (force-volume imaging, amplitude-distance, phase-distance curves), STM (I(z), I(V), Local Barrier Height (LBH), Local Density of States (LDOS). Microscopies: in air: STM/ Atomic Force Microscopy (AFM) (contact + semicontact + noncontact)/ Lateral Force Microscopy (LFM)/ Phase Imaging mode/ Force Modulation mode/ Adhesion Force Imaging/DC&AC Magnetic Force Microscopy (MFM) / DC&AC Electrostatic Force Microscopy (EFM)/ Scanning Capacitance Microscopy (SCM)/ Kelvin Probe Microscopy Lithographies: in air: AFM (Force (scratching + dynamic plowing) and Current (DC&AC ))/ STM; in liquid: AFM (scratching + dynamic plowing). Nano-manipulations: Contact Force Specifications Scanning by sample Scanning by probe Sample size Scanners* Min. scanning step (DAC) SPM heads Optical viewing system XY sample positioning Positioning resolution Heating Temperature stability Vibration isolation Up to 40x10 mm Up to 12x12x2 mm with the liquid cell use 3x3x1.3 µm (±10%); 10x10x2 µm (±10%); 50x50x2.5 µm (±10%) nm; nm; nm AFM STM: 30 pa-50 na, RMS noise 4 pa (standard preamplifier); 10 pa-5 na, RMS noise 1.5 pa (low current preamplifier) Resolution 3 µm Numerical aperture 0.1 Up to 100x20 mm and unlimited for measuring head used for stand alone operation 50x50x2.5 µm (±10%); 100x100x3.5 µm (±10%) (only for Shear Force) 100x100x5 µm (±10%); nm; nm; nm AFM Shear Force Magnification with CCD 48x to 578x Horizontal field of view 6.1 (2) to 0.49 mm 5x5 mm 5 µm 130 C 0.1 C Active vibration isolation system: Active damping (0,6-100 Hz), >100 Hz passive damping. Electric shielding and acoustic isolation is provided by the special cast metal hood * scan range in Z direction is increased twice as much when CLE Closed-Loop Equivalent scanner is used 20 Copyright NT-MDT, 2005

22 Solver PRO Components Measuring heads & SFC050, SFC050SEMI, SFC100, SFC100SEMI, scanners SNC100, SFC050L, SFC100L, SF002, ST005, ST006, SC103, SC110, SC150, CH01L, AD001 Adjustment units AU006, AU007, AU028 Legs LG001, LG006 Liquid cells MP3LC Heating stages SU003 Approach systems SCB22A Vibration and acoustic AC005, DBM05, MOD-1 L, MOD-1 M+, isolation systems TS -150, BM-1, WP001 Special devices AFAM03, XYZ01 Optical systems CCD03o, ССBC1, ССBM1, TR005 Electronics BL022MT, BL022MR, BL0XYZ, BL0XYZR Interface cards IN005 Workstations WSA01, WSA01R Software SWD01, SWD02, SWD05 Cables CE002, IC001 Toolkits SU001, SU002, SU007, SU008, SU015 Professional SPM systems Copyright NT-MDT,

23 Professional SPM systems Solver PRO-M Description Solver PRO-M is a powerful and well-designed universal scientific SPM applicable to almost all areas that SPM can ever be exploited in. Some features make it unique in terms of electronics capability, probe movement precise measurements, and optical system convenience. The Solver PRO-M model has been suited to be driven by the new-generation controller. It has been designed to incorporate modern achievements in microelectronics. Elegant module architecture and many new design solutions allowed creating one of the most powerful "brain" that SPM ever possessed. It contains more than components from the world-best manufacturers as Analog Devices, Burr Brown etc. Very important feature is that the new controller is perfectly suited to work with high frequencies (up to 5 MHz). Thus it is compatible with high frequency cantilevers that can be required to obtain the best quality images. High frequency compliance measurements are also important to perform AFAM (Atomic Force Acoustic Microscopy) NT-MDT unique microscopy technique for imaging samples with differences in local stiffness. The controller is also designed to process capacitive sensors feed-back signal providing precision scanning. Closed-loop control is used to improve the scanning performance and to expand the instrument functionality. Some scanners are equipped with low-noise capacitive XYZ sensors that provide precise positioning by measuring the exact scanner movement. Others can be used with the scanner equivalent equipped with capacitive sensors. The technique compensates common piezoceramics imperfections such as nonlinearity, creep and hysteresis. This is especially fruitful for nanolithographies and nanomanipulations. Integrated low-noise capacitive sensors allow high resolution measurements with sensors switched on for down to nm scan size. Even smaller areas can be successfully measured with the use of closed-loop scanner equivalent. In addition to standard optical microscope with 3 µm spatial resolution, the Solver PRO-M can be supplied with 1 µm resolution optics set enabling to search and see individual objects on the sample surface separated by 1 µm distance from each other Applications New materials Thin films Polymers Semiconductors Biological samples Any other applications which require atomic or molecular resolution in air, gas or fluid environments, as well as in-situ examination of structural changing on the sample surface during heating 22 Copyright NT-MDT, 2005

24 Solver PRO-M Operation modes Microscopies: in air: STM/ Atomic Force Microscopy (AFM) (contact + semicontact + noncontact)/ Lateral Force Microscopy (LFM)/ Phase Imaging mode/ Force Modulation mode/ Adhesion Force Imaging/DC&AC Magnetic Force Microscopy (MFM) / DC&AC Electrostatic Force Microscopy (EFM)/ Scanning Capacitance Microscopy (SCM)/ Kelvin Probe Microscopy (KPM)/ Spreading Resistance Imaging (SRI)/ Atomic Force Acoustic Microscopy (AFAM); in liquid: Atomic Force Microscopy (AFM) (contact + semicontact + non-contact)/ Lateral Force Microscopy (LFM)/ Phase Imaging mode/ Force Modulation mode/ Adhesion Force Imaging. Spectroscopies: AFM (force-volume imaging, amplitude-distance, phase-distance curves), STM (I(z), I(V), Local Barrier Height (LBH), Local Density of States (LDOS). Lithographies: in air: AFM (Force (scratching + dynamic plowing) and Current (DC&AC )/ STM; in liquid: AFM (scratching + dynamic plowing). Nano-manipulations: Contact Force. Professional SPM systems Specifications Sample size Scanners Min. scanning step (DAC) SPM heads Optical viewing system XY sample positioning Positioning resolution Heating Temperature stability Vibration isolation Scanning by sample Up to 40x10 mm Up to 12x12x2 mm with the liquid cell use 3x3x2.6 µm (±10%); 10x10x4 µm (±10%); 50x50x5 µm (±10%) nm; nm; nm AFM STM: 30 pa-50 na, RMS noise 4 pa (standard preamplifier); 10 pa-5 na, RMS noise 1.5 pa (low current preamplifier) Resolution 1 µm Numerical aperture 0.28 Magnification with CCD 230x to 2900x Horizontal field of view 1.2 to 0.1 mm Resolution 3 µm Numerical aperture 0.1 Scanning by probe Up to 100x20 mm and unlimited for measuring head used for stand alone operation 50x50x5 µm (±10%); 100x100x7 µm (±10%) (only for Shear Force) 100x100x10 µm (±10%) nm; nm; nm AFM Shear Force Magnification with CCD 48x to 578x Horizontal field of view 6.1 (2) to 0.49 mm 5x5 mm 5 µm 130 C 0.1 C Active vibration isolation system: Active damping ( Hz), >100 Hz passive damping. Electric shielding and acoustic isolation is provided by the special cast metal hood. Copyright NT-MDT,

25 Solver PRO-M Professional SPM systems Components Measuring heads & SFC050PRO, SFC050LPRO, SF005PRO, SFC050, scanners SFC050SEMI, SFC100, SFC100SEMI, SNC100, SFC050L, SFC100L, SF002, ST005, ST006, SC103, SC110, SC150, CH01L, AD001 Adjustment units AU006, AU007, AU028 Legs LG001, LG006 Liquid cells MP3LC Heating stages SU003 Approach systems SCB22A Vibration and acoustic AC005, DBM05, MOD-1 L, MOD-1 M+, isolation systems TS -150, BM-1, WP001 Special devices AFAM03, XYZ01 Optical systems CCD03o, ССBC1, ССBM1, TR005, OB006 Electronics BL022MTM, BL022MRM, BL0XYZ, BL0XYZR Interface cards IN005 Workstations WSA01, WSA01R, MNR01 Software SWD01, SWD02, SWD05 Cables CE002, IC001 Toolkits SU001, SU002, SU007, SU008, SU Copyright NT-MDT, 2005

26 Professional specialized SPM systems Solver MFM Designed for thorough research of surface magnetic properties with the possibility to apply external magnetic field +/- 0.2T and supporting all known SPM techniques. Solver EC The system is intended to perform the electrochemical studies of adsorption layers formation, metals deposition and dissolution in combination with in situ monitoring of the electrode/solution interface morphology by STM with atomic scale resolution and tunnel spectroscopy. Solver BIO-M The special powerful SPM designed to meet requirements of biological and medical experiments. It allows superimposing optical images gained in inverted optical microscope on SPM images. The system is perfectly suited to perform experiments in physiological conditions. Solver SNOM Specially designed for surface topography measurement and optical characterization with resolution beyond the diffraction limit. Solver LS The special model for automated surface quality control of large samples up to 250 mm in diameter (e.g. data storage media, semiconductors, optical components etc.). Solver HV Special system for operation in low vacuum (up to 10-6 torr) or in a controlled gas environment. Supports scanning at low temperature (down to 50 K). Solver CRYO The unique SPM model specially designed to work at near-to-zero temperatures. Copyright NT-MDT,

27 Professional specialized SPM systems Solver MFM Description The Solver MFM has been developed to visualize and analyze magnetic structures of magnetic films, nanostructures and nanoobjects delivering resolutions on the nano/micro scale, including in-situ measurements in the programmable external in-plane magnetic field up to plus minus 0.2 T. The instrument has been specially designed for the mapping of local magnetic field above a magnetic specimen surface with nanometer scale resolution; as an option, an external controllable in-plane magnetic field can be applied; and magnetization measurement at the desired point of the sample surface as a function of the external magnetic field. Very important is magnetic parts free construction of the head and scanners used in the Solver MFM. Due to the non-magnetic design the external field does not affect scanning process and imaging quality. This is the only one set up on the market that is not influenced by magnetic field. In-plane controlled magnetic field is created by the electromagnet and measured by a Hall sensor. The magnetic field is concentrated on the sample by means of magnetic conductors with the solenoid current. The current is created by a special power supply equipped with software current control. The rotating core design allows flexibility of using any measuring/scanning head thus expanding the system performance for a complete range of measuring modes and techniques. There are two types of magnetic core realized for the choice of the field between 0.1 T and 0.2 T values. The system provides the possibility to investigate magnetostriction effects (residual displacement is less than 10 Å in X, Y direction). Feedback control is possible either on current or magnetic field. Thus the instrument is designed for thorough research of surface magnetic properties by supporting most known SPM techniques. Applications Investigation of hard and soft magnetic materials domain structure Magnetic films Magnetic micro- and nanostructures Data storage devices Investigation of magnetic biological and geophysical samples 26 Copyright NT-MDT, 2005

28 Solver MFM Operation modes Microscopies Spectroscopies Lithographies Nanomanipulation in air: Atomic Force Microscopy (AFM) (contact + semicontact + non-contact)/ Lateral Force Microscopy (LFM)/ Phase Imaging mode/ Force Modulation mode/ Adhesion Force Imaging/ DC&AC Magnetic Force Microscopy (MFM) / Electrostatic Force Microscopy (EFM)/ Scanning Capacitance Microscopy (SCM)/ Kelvin Probe Microscopy (KPM)/ Spreading Resistance Imaging (SRI) AFM (force-volume imaging, amplitude-distance, phase-distance curves), MFM (surface magnetization versus in-plane external magnetic field) AFM (Force (scratching + dynamic plowing) and Current (DC&AC)) Contact Force Professional specialized SPM systems Specifications Sample size Scanners* Min. scan step (DAC) External electromagnet Magnetic Field Magnet pole gap Water cooling Hall device (magnetic field measurement) Optical viewing system Resolution Numerical Aperture Magnification Field of view XY sample positioning Positioning accuracy Vibration isolation Up to 21x3 mm or 21х100х3 mm; or up to 10x3 mm & 10x10x3 mm (depends on the magnetic arms construction used) Note: The maximum sample size can be either up to 100x20 mm, if the electromagnet arms are removed, or unlimited if the measuring head is used as a stand alone device. 100x100x5 µm (±10%); Optional: 3x3x1.3 µm (±10%), 10x10x2 µm (±10%), 50x50x2.5 µm (±10%) nm; nm; nm; nm 0.2 Т (plus-minus) in the probe-sample interface area during the scanning process. The magnetic field is directed along a sample surface. 7 mm or 18 mm (depends on the magnetic arms construction used) Water thermostat with temperature control in the range С Precision programmable linear Hall Effect sensor (Melexis). Programming sensitivity 10 mv/mt. Flux density ±270 mt 3 µm 0.1 from 58x to 578x from 2 to 0.51 mm 5х5 mm 5 µm Active vibration isolation table: Active damping ( Hz), >100Hz passive damping, Electric shielding and protection from acoustic noise are provided by the special slip-cast metal hood. Copyright NT-MDT,

29 Solver MFM Professional specialized SPM systems Components Measuring heads SFM100SEMI, SF002, ST005, ST006, SC103, SC110, SC150 Adjustment units AU006, AU007 Heating stages SU003 Approach systems SCB12A Vibration and acoustic AC005, DBM05, MOD-1 L, MOD-1 M+, isolation systems TS -150, BM-1, WP001 Special devices EMF01, EMF03, CSM01, XYZ01 Optical systems CCD03o, ССBC1, ССBM1, TR005 Electronics BL022MT, BL022MR, BL0XYZ, BL0XYZR Interface cards IN005 Workstations WSA01, WSA01R, MNR01 Software SWD01, SWD02 Cables CE002, IC001, CE003 Toolkits SU001, SU002, SU007, SU Copyright NT-MDT, 2005

30 Solver EC Professional specialized SPM systems Description The Solver EC is designed to study in situ the surface morphology of single- and polycrystal electrodes during electrochemical processes in electrolytic solutions. The instrument allows investigation of the following processes: metals adsorption, deposition and dissolution; obtaining STM images of the electrode/solution interface in situ with atomic scale resolution; and STM measurements such as I(V) spectroscopy (tunnel current vs bias voltage plot) and I(z) spectroscopy (tunnel current vs tip-to-sample separation plot). The Solver EC ensures the experiment purity required for correct electrochemical results acquisition, true STM images and tunnel spectroscopy data. Long term electrochemical and STM experiments without air oxygen and other impurities influence are possible due to the special system maintaining the inert atmosphere (argon, nitrogen, etc.) in a limited volume (about 5 cm 3 ) between the electrochemical cell and the piezoscanner. The system bipotentiostate makes it possible to carry out various electrochemical experiments in potentiostatic, potentiodynamic and galvanostatic modes. The bipotentiostate software provides a user-friendly interface for conducting the experiments, data express analysis and processing. Applications Electrochemistry Optimization and monitoring of metal coating processes New material design Ultra pure materials studies Modes Potentiostatic, Potentiodynamic and Galvanostatic Copyright NT-MDT,

31 Solver EC Professional specialized SPM systems Specifications Bipotentiostat/galvanostat Output Compliance Voltage Applied Voltage Range Current Ranges Reference Input Impedance Modes EC Cell Material Max size Volume of electrolyte EC STM Head Scanner Preamplifier Tips Material Diameter Tip length Isolated part length Insulation Electrodes Working Counter Reference Electrolyte 2 ± 15 V ± 5 V (stability ± 1 mv) ±5mA; ± 100 ua; ± 2 ua (accuracy of measurement ±0.1 % of the range) > 1011 Om manual; sweep (1 mv/s to 100 mv/s), pulse (time resolution 10 ms); potentiostatic current transients; cyclic and linear voltammetry; universal programmer. Teflon 30 x 8 mm 0.05 to 0.1 ml 7x7x2.5 µm (±10%); 18x18x2.5 µm (±10%), STM tips holder ± 50 nа, noise 3 pа. W, Pt-Ir (10 25%) 0.25 mm; up to 20 mm, 5 7 mm. Apiezon Wax; polyethylene. disks 4 15 mm (Au (111), Pt (111), HOPG, polished polycrystalline metals) Cu-wire, Pt-wire, Au-wire Cu-wire, Pt-wire, Au-wire, Ag/AgCl (Cypress system) H2SO4 (0.01 M) + CuSO4 (0.01 M) System of inert atmosphere ensuring Acceptance test nitrogen, argon Underpotential deposition of Cu on Au (111); Electrodeposition of Cu on Au (111), HOPG. Components Measuring heads SFS07EC, SFS18EC, SFC050, SFC050SEMI, SFC100, SFC100SEMI Legs LG001, LG006 Approach systems SCB02A Vibration and acoustic AC005, DBM05, MOD-1 L, MOD-1 M+, isolation systems TS -150, BM-1, WP001 EC options BP001, MP3EC Optical systems CCD03o, ССBC1, ССBM1, TR005, MNR01 Electronics BL022MT, BL022MR Interface cards IN005 Workstations WSA01, WSA01R Software SWD01, SWD02 Cables CE002, IC Copyright NT-MDT, 2005

32 Solver BIO-M Professional specialized SPM systems Description The Solver BIO-M is a special scanning probe microscope for biological and medical applications. It is based on a combination of inverted optical and scanning probe microscopes that enables tip and sample visualization with high optical resolution during the scanning process in different SPM modes. The Solver BIO-M consists of sample and measuring head positioning stages that allow choosing an interesting region for investigation with fine sample-to-tip lateral positioning. This effective tool provides sample surface characterization in ambient and liquid environments. The system closed-loop control compensates common piezoceramics imperfections such as nonlinearity, creep and hysteresis. This is especially fruitful for nano-scale manipulations and pico-scale force measurements. Low-noise capacitive sensors allow high resolution measurements with sensors switched on for down to nm scan size. Exclusive performance of sample-probe force measurements in the pico-newton scale allows the analysis of ligand-receptor interaction, protein unfolding, molecules self-assembling and many other fundamental problems to be solved. Physiological conditions are often required for bio-medical experiments to be performed. Solver BIO-M includes special tools to observe objects in a wide range of different solvents while the temperature can be maintained at C with high precision or at any other value from room temperature to 60 0 C. For more convenient work with cell cultures exclusive design solution has been realized allowing direct observation of cells just in a Petri dish. Transparent materials used for a central part of the device are perfectly suited for simultaneous optical and SPM visualization of living cells. For system allowing cryo-observations of biological objects study Solver HV information. Applications Visualization of macromolecules Quantitative characterization of molecular interactions Modeling experiments in vitro self-assembling complexes, motor proteins etc. Living cell investigations - signal transduction related cytoskeleton dynamics, locomotion, adhesion etc. Nanosurgery and nanomanipulations Copyright NT-MDT,

33 Solver BIO-M Professional specialized SPM systems Operation modes Microscopies in liquid: Atomic Force Microscopy (AFM) (contact + semicontact + non-contact)/ Lateral Force Microscopy (LFM)/ Phase Imaging mode/ Force Modulation mode/ Adhesion Force Imaging. in air: Atomic Force Microscopy (AFM) (contact + semicontact + noncontact)/ Lateral Force Microscopy (LFM)/ Phase Imaging mode/ Force Modulation mode/ Adhesion Force Imaging/ dc & ac Magnetic Force Microscopy (MFM) / DC&AC Electrostatic Force Microscopy (EFM)/ Scanning Capacitance Microscopy (SCM)/ Kelvin Probe Microscopy (KPM)/ Spectroscopies Lithographies Nano-manipulations Spreading Resistance Imaging (SRI) AFM (force-volume imaging, amplitude-distance, phase-distance curves) in liquid: AFM (scratching + dynamic plowing). in air: AFM (Force (scratching + dynamic plowing); Contact Force. Specifications Sample Substrate Scan range Min. Scanning Step XY Sample Positioning Fine Cantilever Positioning Inverted Optical Microscope NOTE: AFM unit with the operating stage can be used in combination with your own microscope (Olympus IX-50 or Olympus IX-70, 71) Optional top viewing system Resolution Field of view Magnification Field of view with color CCD Magnification with color CCD Vibration isolation Coverslips, standard slides and other flat samples up to 75x25 mm Petri dishes mm and mm 22x22x2 mm in the closed liquid cell (optional) 100x100x10 µm (±10%) optional: 100x100x5 µm (±10%), 50x50x2.5 µm (±10%) 100x100x3.5 µm (±10%) or 100x100x7 µm (±10%) for Shear Force only nm; nm; nm; nm; nm 30x30 mm (within 30 mm circle) 4x4 mm with 5 µm resolution Olympus IX-71 Objectives: 4X; 10X; 20X; 40X; [60X; 100X optional] Field of view: 5 mm; 2 mm; 1 mm; 0.5 mm; [0.33 mm; 0.2 mm] (x1) 3.3 mm; 1.3 mm; 0.7 mm; 0.33 mm; [0.22 mm; 0.13 mm] (x1.5) Magnification: 40X; 100X; 200X; 400X; [600X; 1000X] (x1) 60X; 150X; 300X; 600X; [900X; 1500X] (x1.5) Optical techniques: bright-field, phase contrast, (polarization contrast, fluorescence and Nomarski DIC optional) 5 µm 2 mm 28X to 100x 0.9 mm to 2 mm 93X to 325x Passive isolation is integrated. Active anti-vibration system is available by request. 32 Copyright NT-MDT, 2005

34 Solver BIO-M Components Measuring SFC050LPRO, SFC050, SFC050SEMI, SFC100, heads SFC100SEMI, SNC100, SNLG100, SFC050L, SFC100L, CH01L Legs LG002 Liquid cells MP5LCPRO, MP1LC, MP3LC Heating stages SU023 Approach systems LGM01, LGM04 Vibration and acoustic MOD-1 L, MOD-1 M+, TS -150, WP001 isolation systems Special devices XYZ01 Optical systems ССBC1, ССBM1, CCI10, CCI20, CCI03, CCI03o Electronics BL022MTM, BL0XYZ, BTC01 Interface cards IN005 PC and workstations MNR01, WSA01 Software SWD01, SWD02, SWD05 Cables CE002, IC001 Toolkits SU001, SU007, SU015 Professional specialized SPM systems Copyright NT-MDT,

35 Professional specialized SPM systems Solver SNOM Description The Solver SNOM is a scanning near-field microscope that allows the investigation of both the topography and optical properties of surfaces with a resolution of about nm. The optical resolution achieved is far beyond the diffraction limit (about 200 nm for visible light) due to the so-called near-field effect. The principal idea behind the SNOM is to analyze light within a distance of about 10 nm from the sample. This distance is much smaller than the light wavelength. In SNOM the sample surface is illuminated through a sharpened optical fiber tip with a typical aperture of nm brought close to the sample. The optical fiber is mounted onto a quartz tuning fork that is used as a resonant sensor. This allows a constant tip-sample distance to be maintained and surface topography to be measured in the shear-force mode. A special closed-loop scanning stage is used to maintain higher accuracy of the scanning and stability of tip positioning. During scanning of the surface reflected or transmitted light is collected by an inverted optical microscope and light intensity is measured by a CCD camera or PMT, providing optical mapping of the investigated area. Applications Study of semiconductors Materials and optical nanolithography Material sciences Biological applications Polymer investigations Operation modes SNOM: Shear Force/ Transmission/ Reflection/ SNOM Lithography/ Luminescence (optional). Any AFM modes are available with additional measuring heads. 34 Copyright NT-MDT, 2005

36 Solver SNOM Specifications Laser Solid State Laser, 532 nm, 10 mw; Mode TEMoo; Polarization linear 1:100; Stability <2%/8 h; Beam diameter 1 mm; Divergence 1 mrad, Optional: Ar laser: 488 nm, 10 mw; He-Cd laser: 442 nm; 10 mw Coupling unit Coupling efficiency 60 % Resolution 0.05 µm Maximum travel 4 mm Photodetector (software controlled) PMT Module Hamamatsu H , Spectral range nm, Anode to cathode voltage V, Cathode sensitivity 3X106 V/W (420 nm), Dark current 2 na, Time response 0.78 ns; Built-in High Voltage Power supply Built-in I/V converter 106 V/A, Frequency bandwidth 20 khz Optional: Photon Counting Type; PMT Hamamatsu Module: H5783/P; Spectral range nm; Dark counts: 20; Built-in High Voltage Power Supply; Photon Counter PMS 300 (Becker & Hicle) Scan type by sample; optional: by probe Measuring head scan range 100x100x3.5 µm (±10%) Min scanning step nm X,Y sample positioning 5x5 mm Positioning resolution 5 µm Sample size up to 100 mm; 10 mm height X, Y Closed-loop stage X,Y range 100x100 µm (±10%) Residual non-linearity Better than 0.2 % Resolution Repeatability Max normal load Probes Spectrometer Vibration isolation 2 nm 30 nm (typically), less than 0.2 % from the full range 2 kg nm; nm; aperture <100nm SL USB, wavelength range: 475 to 935 nm, Wavelength resolution 1.5 nm Passive isolation is integrated. Active vibration isolation is available by request. Professional specialized SPM systems Note: Solver SNOM based on Olympus IX-70 (71) without closed-loop control is available by request Copyright NT-MDT,

37 Solver SNOM Professional specialized SPM systems Components Measuring heads SNC100, SNLG100, SCTP0, SFC050, SFC050SEMI, SFC100, SFC100SEMI, SFC050L, SFC100L, CH01L Legs LG004 Approach systems LGM01, LGM04 Vibration and acoustic MOD-1 L, MOD-1 M+, TS -150, isolation systems BM-1, OT001 Special devices XYZ01 Optical systems CCD03o, ССBC1, ССBM1, CCI10, CCI03, CCI03o Laser modules LM001, LM002, LM003, LM001o Spectrometers SM001 PMT modules PM001, PM002, PM003 Reflection mode modules OB007 Electronics BL022MT, BL022MR, BL122SMT, BL0LGM, BL0XYZ, BL0XYZR Interface cards IN005 Workstations WSA01, WSA01R, MNR01 Software SWD01, SWD02, SWD07 Toolkits SU001, SU Copyright NT-MDT, 2005

38 Solver LS Professional specialized SPM systems Description Solver LS is a unique system designed for industrial and high throughput screening applications. The main tip is that it is perfectly suited to deal with large samples (up to 250 mm in diameter). It makes the Solver LS to be the best choice when nano-scale properties of a rather extensive objects are of interest e.g. bumps and pits in CD or DVD manufacturing or surfaces roughness in optical lenses quality control. Another area of Solver LS applicability is automated screening of a big number of micro-samples. Nano-scale properties can be very informative for macro-scale properties prediction e.g. in polymer design industry when variation in parameters synthesis cause changes in sample surface characteristics and mechanical properties that in turn correlate with the plastics macro-scale properties. SPM screening of micro-samples makes it possible to perform thousands of iteration cycles in a short time to optimize synthesis parameters. The Solver LS is capable to automatically analyze up to 4 large cartridges, each of them carrying tens of micro-samples. For each micro-sample the following information enters the database: Optical image; AFM image; Large set of quantitative parameters as measured in different AFM regimes. Applications Semiconductors: roughness control of silicon wafers; topography defects control and characterization; conductivity control of contact plates; recognition of doping level difference; cleaning process control; resist residuals identification. Data storage media: morphology control of magnetic films; roughness control of starting materials; visualization of magnetic bits and their orientation; controlled surface modification using the Lithography modes. Optical components: surface quality control; visualization and 3D measurements of polishing residuals such as scratches, wells, grooves etc; final control of surface roughness. High throughput screening of micro-samples. Copyright NT-MDT,

39 Solver LS Professional specialized SPM systems Operation modes Microscopies in air: Atomic Force Microscopy (AFM) (contact + semicontact + noncontact)/ Lateral Force Microscopy (LFM)/ Phase Imaging mode/ Force Modulation mode/ Adhesion Force Imaging/ DC&AC Magnetic Force Microscopy (MFM) / DC&AC Electrostatic Force Microscopy (EFM)/ Scanning Capacitance Microscopy (SCM)/ Kelvin Probe Microscopy (KPM)/ Spectroscopies Lithographies Nano-manipulations Spreading Resistance Imaging (SRI) AFM (force-volume imaging, amplitude-distance, phase-distance curves) in air: AFM (Force (scratching + dynamic plowing) and Current (DC&AC); Contact Force. Specifications Sample size Sample holders Scanners Min. scanning step (DAC) Motorized positioner Inspectable area Linear resolution Bi-directional repeatability Angular Resolution Angular Repeatability Optical system Resolution Field of view Magnification Motorized zoom and focus Vibration isolation Up to 250 mm in diameter Up to 15 mm thick Vacuum chuck for CD stampers, replicas and glass master discs Universal vacuum chucks for hard discs, semiconductor wafers from 50 mm to 150 mm, vacuum chucks for 200 mm and 250 mm (optional). 50x50x2.5 µm (±10%), 100x100x5 µm (±10%) nm; nm up to 250 mm in diameter with linear and rotary stage 2 µm 1 µm degree degree 1.5 µm Max 1.2x0.9 mm, Min 120x90 um with color 1/2" CCD on 14" monitor 207x-2070x Passive isolation is integrated Active vibration isolation is available by request Components Measuring heads SFL150SEMI, SFL100SEMI Vibration and acoustic MOD-1 L, MOD-1 M+, TS -150, BM-1 isolation systems Holders and frames TB001, TB003, VH001, VH002, VH003, VP001, VP002, VP003, VP004 Special devices XYZ01 Optical systems CCD15TRo, CCBC1, LS004, LS005 Electronics BL022LMT, BL0XYZ Interface cards IN005 Workstations WSA01, WSA01R, MNR01 Software SWD01, SWD02 38 Copyright NT-MDT, 2005

40 Solver HV Professional specialized SPM systems Description A great number of problems and processes in the field of modern nanophysics and nanotechnology must be investigated in high vacuum or a controlled gas atmosphere. The use of scanning probe microscopy in high vacuum gives the user the following abilities. Scanning at low temperatures with no condensation of an undesirable vapor on a sample surface; performing high resolution measurements and nanolithography; work in a controlled gas atmosphere. The Solver HV offers the opportunity to perform SPM measurements in a wide range of temperatures ( К). The scanning system has been deliberately optimized for low thermal drift, which plays the most important role during any investigation at changing temperature conditions. Due to the high resolution, it makes it possible to investigate different types of phase transformation, including superconductive, magnetic, structural transformations on the surface. The performance of an atomic force microscope is greatly increased in a high vacuum environment. The reason is that when there is no ambient atmosphere the cantilever q-factor is increased leading to higher cantilever sensitivity. This property makes it possible to substantially reduce the limit of interaction force measurement between the probe and sample surface, and to achieve the highest resolution in magnetic measurements. To expand system performance controlled external magnet field (± 0.1 T) can be applied. Operation in controlled atmosphere can be critical if measurements or nanolithography are to be made on the sample that should not be exposed to oxygen or other components of ambient air. Surface modification by tip-targeted deposition from gaseous phase also is possible with the Solver HV. Many biological structure-studying experiments require fast cryo-fixation of the object followed by cryo-preservation keeping the intact fine structure to be unmodified during the sample preparation. For this purpose the Solver HV is the best choice as it allows observing the object with high-resolution SPM at low temperatures. Applications High resolution SPM Ultra weak currents and magnetic interactions Biomolecules and biomaterials cryo-investigations including deep-etching studies High resolution nanolithography New material design (at controlled atmosphere) Copyright NT-MDT,

41 Solver HV Professional specialized SPM systems Operation modes Microscopy modes Spectroscopies Lithographies Nano-manipulations Atomic Force Microscopy (AFM) (contact + semicontact + non-contact)/ Lateral Force Microscopy (LFM)/ Phase Imaging mode/ Force Modulation mode/ Adhesion Force Imaging/ DC&AC Magnetic Force Microscopy (MFM) / DC&AC Electrostatic Force Microscopy (EFM)/ Scanning Capacitance Microscopy (SCM)/ Kelvin Probe Microscopy (KPM)/ Spreading Resistance Imaging (SRI) AFM (force-volume imaging, amplitude-distance, phase-distance curves) AFM (Force (scratching + dynamic plowing) and Current (DC&AC)) Contact Force Specifications Sample size Scan range Min. scanning step (DAC) Scan type XY sample positioning Positioning resolution Vacuum, torr Temperature control o Up to 10x10 mm 50x50x2.5 µm (+/-10%) nm Scanning by probe 3х3 mm by step motors in vacuum 5 µm 10-6 Room temperature С 50K C - optional (using liquid He) 110K C - optional (using liquid N2) Environment Control Optical viewing system Magnetic field Vibration isolation Controlled humidity (5 to 80%), CF35, port for mass spectrometer, humidity sensing element Resolution 5 µm Numerical aperture 0.1 Magnification with CCD 48x to 578x Horizontal field of view 2 to 0.49 mm Optional: ±0.1 T Passive vibration isolation inside the chamber Active vibration isolation system: Active damping ( Hz), >100Hz passive damping Components Measuring heads SFMV150 Positioning systems AP1SM Heating stages SU043 Vibration and acoustic MOD-NT01 isolation systems Chambers, vacuum options VCI03, CF001, CF002, VGT01, VNT01 Special devices XYZ01 Optical systems CCD03o, ССBC1, ССBM1, TR006, OB004 Electronics BL022MTM, BL022MRM, BL022MT, BL022MR, BL0XYZ, BTC01, BL0XYZR Interface cards IN005 Workstations WSA01, WSA01R, MNR01 Software SWD01, SWD02 40 Copyright NT-MDT, 2005

42 Solver CRYO Professional specialized SPM systems Description Solver CRYO has been developed to meet requirements of low temperature physics. Being able to work at temperature of several K this powerful instrument allows obtaining comprehensive information about the matter at near-to-zero temperature. Surface property data obtained by high resolution STM techniques can be supplemented with optical properties as characterized by SNOM*. Applications Low temperature solid-state physics (semiconductors, superconducting materials) Modes available STM/ STS* Specifications Sample size: 10x10x3 mm Scan range: 30x30x3 µm Minimal scanning step: nm Scanning unit diameter: 38 mm Development of quantum computer * Contact your local sell representative to confirm the list of modes available Copyright NT-MDT,

43 Controller Controller Block scheme of the SPM controller with connection to measuring systems of microscopes 42 Copyright NT-MDT, 2005

44 Description SPM controller is a "brain" of the SPM. Its reliability and stable work are crucial for the whole SPM system functioning. Solver-line controller is a time-proven unit supporting qualitative work of hundreds of Solver-line SPMs world-wide. It has 22-bit composite DAC resolution in all directions (XYZ). Lock-in amplifier with a frequency range 1 khz to 2 MHz enables operation in modulation AFM methods (including semicontact AFM mode). Digital frequency generators are involved in probe vibration modulation extending the modulation methods resolution down to 0.01 Hz. The system of signals collection includes 16-bits ADCs with software controlled low pass filters and programmable gain amplifiers and is able to get precision information of the object under investigation. Important feature is that most settings are software controlled it is crucially required to work in two-pass (many-pass) AFM modes such as EFM, MFM, KPM, and SCM. Some of the newest Solver models, such as the Solver PRO-M and the Solver BIO-M are driven by the new-generation electronics control module. This set has been designed to incorporate modern achievements in microelectronics. Elegant module architecture and many new design solutions allowed creating one of the most powerful "brain" the SPM ever possessed. It contains more than components from the world-best manufacturers (Analog Devices, Burr Brown etc.) and provides operation with high frequencies (up to 5 MHz) and capacitance sensors providing fine correction of scanning parameters. Controller Technical Specification Size Weight Voltage supply Power HV AMPLIFIER Scanner drive Resolution Max load current Bandwidth Capacitance load MODULATION BLOCK Generators Modulation features Modulation detectors ADC Control Software External I/O Control Terminal Scan control Signal Input 445x160x500 mm 14.5 kg V, 50Hz/60 Hz 60 W (without optional devices) X, Y: V Z: V 22-bit compound DAC X, Y: 0.2 ma Z: 2 ma X, Y: 2.5 khz Z: 15 khz X, Y: max 50 nf Z: max 100 nf Digital with 32-bit resolution Z, Bias Voltage, External Outputs Independent lock-in amplifier Phase detector RMS detector Two 16-bit ADCs with software control and input filters Gain: 1, 10, 100, 1000 All hardware settings are software controlled 1 digital output 3 analog inputs ±10V Copyright NT-MDT,

45 Software The software is a full-featured, user-friendly package compatible with Windows 95/98/XP that enables quick data acquisition and the most comprehensive image processing and analysis. The special built-in "Smart Software" wizard will guide you step-by-step through all settings required for the scanning operation (e.g. laser and photodiode adjustment, cantilever resonance frequency adjustment, setting up the parameters for operation in contact and semicontact AFM modes), making it so easy to start your experiment right away. The software NOVA provides a flexible control of many working parts and microscope utilities. It combines powerful tools for image processing with nice-looking and intuitive interface. The software-realized self-recognition option is included making the auto-adjustment possible. Depending on operator skills the system permits "one-button-push" work or deep hardware control. Macros language supplied with the software package makes it very easy to perform routine operation's automation as well as opens up the way for the control of the SPM hardware functioning. It will be helpful to begin the SPM operation (program the system to perform complicated operations file by several mouse clicks) and will give enormous advantages for the advanced users running applications without the program recompilation. To quickly learn how to use the instrument in different measuring modes, the special educational program "SPM Techniques Educator" can be supplied with any Solver SPM. This program consists of a number of Flash animations together with brief descriptions of each technique available with the instrument. 44 Copyright NT-MDT, 2005

46 SPM related products and accessories Contents Important features Measuring heads and scanners Scanning stage Adjustment units Legs Positioning systems Liquid cells Heating stages Approach systems Vibration and acoustic isolation systems Holders and frames Chambers, vacuum options Special devices EC options Optical systems Laser modules Spectrometers PMT modules Reflection mode modules Electronics Interface cards Workstations Software Cables Toolkits Copyright NT-MDT,

47 SPM related products and accessories Important features CLE Closed-loop control is very powerful method to improve scanner performance (caused by common piezoceramics imperfections such as nonlinearity, creep and hysteresis), but it also has some drawbacks. Sensors themselves always have some intrinsic noise although it can be quite low in modern systems. That is why sensors usually must be turned off when small surface areas are analyzed. Usually closed-loop control is not applicable for scans smaller than 1x1 µm. Although modern NT-MDT systems have sensors with very low noise parameters (that provide excellent results with sensors switched on for scan size down to nm) the usability of the sensors on smaller scans is limited. For the closed-loop control on even smaller areas the unique CLE technology (Closed-Loop Equivalent) is used. Scanner Equivalent is an external "twin" (sensor-equipped real-time model) of the active scanner but it has bigger scan range. Relative noises of such model are very low providing all advantages of the sensors closed-loop control even for areas down to 5 10 nm (3 µm or 10 µm working scanners should be used). The working scanner and the equivalent one are connected parallel to the auxiliary control unit and then to the SPM controller in order to provide movement synchronism and closed-loop control of scanning. This way the equivalent scanner compensates the scanner non-linearity and the creep effect allowing one-step zoom as accurate as 2 5% from the whole scanning range in any part of the range (compare to % positioning error while zooming without CLE). So, with the use of CLE one can zoom in on a feature of interest at once from any position within the scan range in order to characterize this feature at higher resolution. Moreover, the equivalent scanner improves the accuracy/linearity of vector nanolithography operation and enables experiments where manipulation of nanoobjects is required. It is very important that CLE usually does not require a system exchange, but any system within Solver line can be upgraded for the CLE and get performance improvement any time. 46 Copyright NT-MDT, 2005

48 Important features Optical systems In the simplest case an optical viewing system allows to remain seeing when targeting the probe to the sample surface. It consists of a stage, a microscope, and a camera. The optical viewing system really helps to adjust an AFM as well as to view the probe and the sample surface on the monitor while scanning, when the eye-glass of the optical microscope stays fixed in vertical position. NT-MDT supplies its SPMs with exclusively comfortable, powerful, and versatile optical systems. Very often it is required to change a head during sample investigation. And it would cause much trouble to adjust the optical viewing system if there weren't a special know-how invented. Our easy-to-use optical system stage can be switched between three working positions only by turn-and-click. First position provides direct observation from above to be performed in scanning-by-sample scheme. Second position allows tip-sample viewing during scanning by probe. Special mirrors are used for the optical microscope to be used in vertical top position. Third position allows viewing along the surface to be scanned. It is especially helpful to see what is happening right beneath the probe. Thus, the optical system allows seeing directly on a monitor what is happening around the probe. Due to the well considered technical solution of the optical microscope stage it is easy and comfortable to switch between viewing positions and change measuring heads keeping the same area of the sample surface in view. SPM related products and accessories First position Second position Third position The described optical system provides 3 µm spatial resolution with 10x zoom that makes it easy to observe large areas, select the object on the sample surface and to monitor the scanning process simultaneously with optics and the SPM. It is included in standard configurations of most SPMs like Solver P47-PRO, Solver P47H-PRO, and Solver PRO. The Solver PRO-M can be supplied with 1µm resolution optics in addition to the standard set that provides the possibility to search and see individual objects on the sample surface separated by 1 µm distance from each other. Copyright NT-MDT,

49 SPM related products and accessories Measuring heads and scanners Scanning heads SFC050LPRO Universal SPM scanning head SMENA. For basic AFM modes in liquid. Scanner with capacitance sensors: 50x50x5µm (+/-10%). Cantilever tracking system, tip-to-sample manual approach system. Replaceable cantilever holders for operation in air and liquid. Extended frequency band range of cantilever registration up to 5MHz. Only with BL022MTM, BL022MRM. SFC050LPRO SFC050PRO Universal SPM scanning head SMENA with sensors. Scanner with capacitance sensors: 50x50x5µm (+/-10%). Cantilever tracking system, preamplifiers, tip-to-sample manual approach system. Extended frequency range of cantilever registration up to 5MHz, extended bias voltage driving range up to 500 khz. Only with BL022MTM, BL022MRM. SFMV150 High vacuum SPM scanning head SMENA-A with non magnetic parts for MFM applications. Scanner with capacitance sensors 50x50x2.5µm (+/-10%). Cantilever tracking system, tip-to-sample motorized approach system. SFC050 Universal SPM scanning head SMENA for basic AFM modes in air. Scanner: 50x50x2.5µm (+/-10%). Cantilever tracking system, tip-to-sample manual approach system. SFC050SEMI Universal SPM scanning head SMENA. Modification of SFC050 for operation in additional modes: SCM, SKM, Spreading Resistance Imaging and Voltage Lithography. Scanner: 50x50x2.5µm (+/-10%). Cantilever tracking system, tip-to-sample manual approach system. SFC050PRO SFMV150 SFC050, SFC050SEMI 48 Copyright NT-MDT, 2005

50 Scanning heads SFC100 Universal SPM scanning head SMENA for basic AFM modes in air. Scanner: 100x100x5µm (+/-10%). Cantilever tracking system, tip-to-sample manual approach system. SFC100SEMI Universal SPM scanning head SMENA. Modification of SFC100 for operation in additional modes: SCM, SKM, Spreading Resistance Imaging and Voltage Lithography. Scanner: 100x100x5µm (+/-10%). Cantilever tracking system, preamplifiers, tip-to-sample manual approach system. SFC100, SFC100SEMI SPM related products and accessories SFM100SEMI Universal SPM scanning head SMENA with non magnetic parts for MFM applications. Modification of SFC100 for operation in additional modes: SCM, SKM, Spreading Resistance Imaging and Voltage Lithography. Scanner: 100x100x5µm (+/-10%). Cantilever tracking system, preamplifiers, tip-to-sample manual approach system. SFL150SEMI Universal SPM scanning head. Modification of SFL050 for operation in additional modes: SCM, SKM, Spreading Resistance Imaging and Voltage Lithography. Scanner: 50x50x2.5µm (+/-10%). Cantilever tracking system. SFL100SEMI Universal SPM scanning head. Modification of SFL100 for operation in additional modes: SCM, SKM, Spreading Resistance Imaging and Voltage Lithography. Scanner:100x100x5µm (+/-10%). Cantilever tracking system. SFM100SEMI SFL150SEMI, SFL100SEMI Copyright NT-MDT,

51 Scanning heads SPM related products and accessories SNC100 Shear Force (SNOM) scanning head with quartz detector of fiber vibration (without SNOM illumination and detection system). Scanner: 100x100x3.5 µm (+/-10%). SNLG100 Shear Force (SNOM) scanning head with quartz detector of fiber vibration (without SNOM illumination and detection system). Scanner : 100x100x3.5 µm (+/-10%). Motorized approach leg for XY scanning stages with manual positioning. SNC100, SNLG100 SFC050L Universal SPM scanning head SMENA. Modification of SFC050 for operation in basic AFM modes in liquid. Scanner: 50x50x2.5µm (+/-10%). Cantilever tracking system, tip-to-sample manual approach system. Replaceable cantilever holders for operation in air and liquid. SFC100L Universal SPM scanning head SMENA. Modification of SFC0100 for basic AFM modes in liquid. Scanner: 100x100x5µm (+/-10%). Cantilever tracking system, tip-to-sample manual approach system. Replaceable cantilever holders for operation in air and liquid. CH01L Replaceable cantilever holder for operation in liquid. For SFC050L, SFC100L, SFC050LPRO. AD001 Z-off adapter and XY-off adapter SFC050L SFC100L CH01L AD Copyright NT-MDT, 2005

52 Measuring heads SF002 Universal SPM head for Solver P47-PRO and Solver PRO. SF005PRO Universal SPM head for Solver PRO-M. Modified for the use with high resolution optics (1µm). SF002 SPM related products and accessories ST005 STM head with preamplifier 30pA-50nA. Open configuration allows easy access to sample-tip area for high aperture illumination. Only for SCB02A. ST006 STM head with low current preamplifier 10pA-5nA. Open configuration allows easy access to sample-tip area for high aperture illumination. Only for SCB02A. SF005PRO Scanners SC103 Replaceable scanner: 3x3x1.3µm (+/-10%). SC110 Replaceable scanner: 10x10x2 µm (+/-10%). SC150 Replaceable scanner: 50x50x3µm (+/-10%). ST005 ST006 SC103, SC110, SC150 Copyright NT-MDT,

53 SPM related products and accessories Scanning stage SCTP0 X, Y scanning stage with strain gauge sensors for closed-loop operation, 100x100µm range, residual non-linearity 0,1% (typically). Manual positioning of SMENA head over the range of 5x5 mm, positioning resolution 5 µm. Intended for Olympus IX-50, IX-70, IX-71. SCTP0 Adjustment units AU006 Adjustment unit for Contact and Resonant AFM modes. Includes the capability to measure current through the conductive cantilever. AU007 Adjustment unit for Contact and Resonant AFM modes. Includes the capability to apply bias voltage and ac voltage to conductive cantilever. For SCM/SKM modes. AU028 Adjustment unit with open liquid cell (liquids water or organic solvents) for Contact and Resonant modes. AU006, AU007 AU Copyright NT-MDT, 2005

54 Legs LG001 Standard legs for SMENA heads (SFC100, SFC100SEMI, SFC050, SFC050SEMI). For mounting SMENA heads on SCB02A, MP1SM and for Stand Alone operation. LG003 LG001, LG003 SPM related products and accessories Legs for the SMENA head modification for 5'' samples investigation. LG002 Legs for SMENA head for the use with Solver BIO (based on OLYMPUS). LG004 Legs for mounting SMENA head on the closed-loop stage. LG006 Legs for SMENA heads SFC050L, SFC100L. For mounting SMENA heads on SCB02A, MP1SM, MP1LC, MP3LC and for Stand Alone operation. LG002, LG004 LG006 Copyright NT-MDT,

55 SPM related products and accessories Positioning systems MP1SM Manual X, Y positioning stage for SMENA with magnetic sample holder. Range of sample positioning 5x5 mm, positioning resolution 5 µm. AP1SM MP1SM Automatic X, Y positioning stage for SMENA vacuum head. Range of sample positioning 3x3 mm, positioning resolution 5 µm. Liquid cells MP5LCPRO Closed (quasi-hermetic) liquid cell with flow-through possibility. For Petri dishes. Heating up to 50C, for biological applications. Range of sample positioning 1x1 mm (limited by the membrane), positioning resolution 5 µm. For SMENA heads SFC050LPRO used with CCI03 and CCI03o. MP1LC Manual X, Y positioning stage with closed liquid cell with flow. For biological applications. Range of sample positioning 1x1 mm, positioning resolution 5 µm. For SMENA heads SFC050L, SFC100L. MP3LC Closed (hermetic) liquid cell with flow-through possibility. For biological applications. Range of sample positioning 1x1 mm (limited by the membrane), positioning resolution 5 µm. For SMENA heads SFC050LPRO, SFC050L, SFC100L used with SCB02A, SCB22A. AP1SM MP5LCPRO MP3LC MP1LC 54 Copyright NT-MDT, 2005

56 Heating stages SU003 Sample holder with heating stage (up to 130 C) and temperature sensor. Stability of the temperature 0.1 C. Set of 5 polycrystalline sapphire substrates. For Solver P47H, Solver PRO, Solver P47. SU013 SU003, SU013, SU023 SPM related products and accessories Sample holder with heating stage (up to 130 C) and temperature sensor, cable length 2 m. Stability of the temperature 0.1 C. Set of 5 polycrystalline sapphire substrates, 3 metal clips. For Solver LS. SU023 Sample holder with heating stage (up to 130 C) and temperature sensor. Stability of the temperature 0.1 C. Set of 5 polycrystalline sapphire substrates, 3 metal clips. For Solver BIO. SU043 Sample holder with heating stage (up to 150 C) for Solver HV. SU043 Copyright NT-MDT,

57 SPM related products and accessories Approach systems SCB22A Sample base for Solver PRO. Includes sample-to-tip automatic approach system, adjustable viewing mirror, air/gas inlet, scanner connector, bias voltage and heating stage SU003 connectors. Manual X, Y positioning stage. Range of sample positioning 5x5 mm, positioning resolution 5 µm. SCB22A SCB02A Sample base for Solver P47, Solver P47H, Solver PRO. Includes sample-to-tip automatic approach system, adjustable viewing mirror, air/gas inlet, scanner connector, bias voltage and heating stage SU003 connectors. Manual X, Y positioning stage. Range of sample positioning 5x5 mm, positioning resolution 5 µm. SCB12A Sample base for Solver MFM. Includes sample-to-tip automatic approach system, adjustable viewing mirror, air/gas inlet, scanner connector, bias voltage and heating stage SU003 connectors. Manual X, Y positioning stage. Range of sample positioning 5x5 mm, positioning resolution 5 µm. LGM01 Motorized approach leg for SMENA, SNC080 heads. LGM04 Motorized approach leg for SMENA, SNC080 heads for XY scanning stage SCTP0 with manual positioning. SCB02A SCB12A LGM01 LGM04 56 Copyright NT-MDT, 2005

58 Acoustic isolation AC004 Protective cover for electric shielding and acoustic isolation for Solver P47H-PRO, Solver P47-PRO. AC005 Protective cover for electric shielding and acoustic isolation for Solver PRO. WP001 AC004 SPM related products and accessories Acoustic enclosure and marble table. Acoustic suppression in the band 1kHz 30db. Enclouser size: External: 100x60x100 sm 3, internal: 90x50x95 sm 3. Marble stage size: 104x64x5sm 3. Metal support frame 80x80x85sm 3. Overall system size 104x64x190sm 3. Weight 500 kg. AC005 WP001 Copyright NT-MDT,

59 SPM related products and accessories Vibration isolation passive DBM01 Vibration isolation system. Cables to connect with SPM controller. DBM03 Antivibration suspension for SMENA heads on MP1SM. DBM05 Support base for Solver PRO. Compatible with TR005. Connecting unit with cables to SPM controller. DBM01 DBM03 DBM05 58 Copyright NT-MDT, 2005

60 Vibration isolation active MOD-1L Vibration isolation system. Active damping (0,6 100Hz), >100Hz passive damping. 90 kg max. load. Table top 600 X 600 mm. (Halcyonics, Germany.) Weight 42kg. MOD-1M+ MOD-1L, MOD-1M+ SPM related products and accessories Vibration isolation system. Active damping (0,6 100Hz), >100Hz passive damping. 90 kg max. load. Table top 400 X 400 mm. (Halcyonics, Germany.) Weight 30kg TS-150 The dynamic vibration isolation system. Isolation: dynamic 0.7 to 1000 Hz, passive beyond 1000 Hz. Transmissibility: Above 10 Hz transmissibility <0.01 (-40dB). System noise: less than 50 ng/ from Hz in any direction. 150 kg max. load. Table top 400 X 450 mm. (JRS Scientific Instruments, Germany). Weight 16 kg. BM-1 The passive vibration isolation system by Minusk technology. BM-1 Biscuit Bench Top. (Minus-K, USA). Weight 27 kg MOD-NT01 Vibration isolation system. Active damping (0,6 100Hz); >100Hz passive damping. 300 kg max. load. Table top 600 X 600 mm. With special additional vibration isolation system for vacuum chamber. OT001 Optical table. Size 900x1400 sm, thickness 120mm, weight 116 kg, laser shelve. Resonant frequency 100Hz, flatness +/- 0,05 mm/m2. Standa 1HT TS-150 BM-1 MOD-NT01 OT001 Copyright NT-MDT,

61 SPM related products and accessories Holders and frames TB001 Titanium frame, motorized translation stage (range 200mm) and rotary stage (angle of rotation from 0 to 360 degrees), vibration isolation legs. Max. sample size 250mm. Tip-to-sample approach system. TB003 Titanium frame for double side wall measurement, motorized translation stage (range 200mm) and rotary stage (angle of rotation from 0 to 360 degrees), vibration isolation legs. Sample size 150mm. Tip-to-sample approach system. VH001 VH001 Vacuum sample holder for CD/DVD discs, stampers and glass master discs. VH002 Universal vacuum sample holder for semiconductor wafers (50 150mm), CD/DVD stampers, HDD and small samples (min size 10 mm in diameter). Max possible sample diameter 250 mm. VH003 Universal vacuum sample holder for semiconductor wafers (50 150mm), CD/DVD stampers, HDD and small samples (min size 10 mm in diameter). For TB003. VH002 VH Copyright NT-MDT, 2005

62 Holders and frames VP001 Vacuum/pressure pump with receiver. 120V VP002 Vacuum ejector pump. Provides vacuum 70 torr, free air capacitance l/min with receiver. VP003 Receiver. VP004 VP003 SPM related products and accessories Vacuum/pressure pump with receiver. 240V Chambers, vacuum options VCI03 Vacuum chamber. Fore-vacuum pump and turbo-molecular pump Turbovac 340M with controller, CF160 (for 10-7 тоrr) with electromagnetic braking. Pipes, tubes, connectors, heating belts and other necessary accessories. Vacuum measuring system. Passive vibration isolation system. CF001 "Cold finger" system (with the use of liquid He) to provide cooling down to 50K and heating up to 150 C with thermocontroller. Cryo panel with added small dewar bottle. (Only with VNT01) CF002 "Cold finger" system (with the use of liquid N 2 ) to provide cooling down to 110K and heating up to 150 C with thermocontroller. Cryo panel with added small dewar bottle. (Only with VNT01) VNT01 Nitrogen trap, CF160. Pumping speed for water molecules about 1000l/s. VGT01 Manual gate valve - CF160. VCI03 CF002 VGT01 VNT01 Copyright NT-MDT,

63 SPM related products and accessories Special devices EMF01 Electromagnet to provide magnetic field up to 2 kgauss (0.2 Tesla) in probe-sample area during scanning. Gap between the magnet conductor arms 7 mm. Magnetic field is directed along the sample surface. Non-magnetic insert positioning table two pieces for 1.5 mm and up to 3 mm thick samples. (Optional: special non-magnetic insert for any thick samples up to 10 mm) Water Cooling. The connectors and pipes to be provided to connect to the lab water system. Power supply for the electromagnet with computer control. Max sample size 15 mm in diameter, thickness 3 mm. Magnetic field measuring device Holl detector. Control Software is modified for magnetic field calibration. EMF01 EMF02 Electromagnet to provide magnetic field about 1 kgauss (0.1 Tesla) in probe-sample area during scanning. Gap between the magnet conductor arms 20 mm. Magnetic field is directed along the sample surface. Non-magnetic insert positioning table. Power supply for the electromagnet with computer control. Max sample size 15 mm in diameter. Control Software is modified for magnetic field calibration. For Solver HV. EMF03 Electromagnet to provide magnetic field up to 1 kgauss (0.1 Tesla) in probe-sample area during scanning. Gap between the magnet conductor arms 18 mm. Magnetic field is directed along the sample surface. Non-magnetic insert positioning table two pieces for 1.5 mm and up to 3 mm thick samples. (Optional: special non-magnetic insert for any thick samples up to 10 mm) Water Cooling. The connectors and pipes to be provided to connect to the lab water system. Power supply for the electromagnet with computer control. Max sample size 15 mm in diameter, thickness 3 mm. Magnetic field measuring device Holl detector. Control Software is modified for magnetic field calibration. CSM01 Cooler WKG230 for external magnets EMF01, EMF03. EMF02 EMF03 CSM01 62 Copyright NT-MDT, 2005

64 Special devices AFAM03 The AFAM upgrade pack containing: AFAM mode license, AFAM software upgrade with free of charge upgrade clause, AFAM acoustic transducer, AFAM cable set, AFAM description and application manual. Transducer holder requires SCB02A. For universal SPM scanning heads SFC050L, SFC050SEMI, SFC100L, SFC100SEMI. Frequency range 1.5 MHz XYZ01 X,Y,Z closed-loop equivalent scanner to provide one-step zoom, nonlinearity correction in Z direction to less than 3%, creep compensation, double Z range. AFAM03 SPM related products and accessories EC options BP001 Bipotentiostat, cables to connect with PC and controller. Bipotentiostat control software. Bipotentiostat parameters: output voltage +/- 15 V, max current on the probe +/-50 na, noise 3 pa, current on the working electrode (on the sample) +/- 5 ma or +/-50 µa, +/-5µA. Other current canals of sworking electrode are optional. SFS07EC STM scanning head with preamplifier +/-50nA, noise 3pA. Scanner: 7x7x1.5µm (+/-10%), STM tips holder. SFS18EC STM scanning head with preamplifier +/-50nA, noise 3pA. Scanner: 18x18x2.2µm (+/-10%), STM tips holder. MP3EC Electrochemical cell, frame for cell fixation, closed chamber for argon chemical cleaning, spare electrode. XYZ01 BP001 SFS07EC, SFS18EC MP3EC Copyright NT-MDT,

65 SPM related products and accessories Optical systems Videomicroscopes CCD15TRo Video microscope (ONLY for Solver LS). Resolution 1.5 µm, magnification with color 1/2" CCD on 14" monitor , field of view max 1.2x0.9 mm, min 120x90 mm. Motorized focus and zoom, control unit. Modification of SPM head included. (CCD camera and monitor are not included.) CCD03o CCD15TRo Video microscope with manual continuous zoom. Numerical aperture 0.1, magnification with 1/2 " CCD camera on 14" monitor 47x to 578x, horizontal field of view 6,1 to 0, 49 mm (horizontal field of view 2 to 0, 49 mm for SMENA). Color or B/W CCD camera and color or B/W monitor to be supplied by NTI or by the distributor/customer to comply with NTI requirements. CCD05o Videomicroscope with manual continuous zoom and 5mm focus. Numerical aperture up to 0.1, magnification with 1/3" CCD camera on 14 " monitor 63x to 776x, horizontal field of view 4.5 to 0.37 mm, (horizontal field of view 2 to 0.37 mm for SMENA). Color or B/W CCD camera and color or B/W monitor to be supplied by NTI or by the distributor/customer to comply with NTI requirements. (Manual Zoom, Coaxil Illuminator with Fine Focus, Fiber Optic Lamphouse, Fiber Optic Adapter, Flexible Bundle 60", Lamphouse 230 Volt/150Watt, 2X Mini TV Tube, Replacement Lamp, 0.75X Auxiliary Lens, 25mm - M26x36T Adapter) CCD03o CCBC1 Cameras CCBC1 Color CCD camera: SenTech STC-P63CJ (1/3" PAL) 64 Copyright NT-MDT, 2005

66 Inverted optical microscopes CCI10 Inverted optical microscope OLYMPUS IX-71. For Solver SNOM. CCI20 Inverted optical microscope OLYMPUS IX-71. For Solver BIO. CCI03 SPM related products and accessories SPM based on inverted optical microscope OLYMPUS IX-71. X,Y sample positioning range 30x30mm (within 30mm circle), fine cantilever positioning range 4x4mm, tip-to-sample parallel approach, vibration isolation base, sample holder for Petri dishes, standard slides, coverslips etc. Tip and sample viewing in bright field, phase contrast, and other optical techniques. (SPM scanning head SMENA is not included.) CCI10, CCI20 CCI03o SPM based on inverted optical microscope OLYMPUS IX-71. X,Y sample positioning range 30x30mm (within 30mm circle), fine cantilever positioning range 4x4mm, tip-to-sample parallel approach, vibration isolation base, sample holder for Petri dishes, standard slides, coverslips etc. Tip and sample viewing in bright field, phase contrast, and other optical techniques. (OLYMPUS IX-71and SPM scanning head SMENA are not included.) Adjustable mirrors CCI03 MA001 Adjustable mirror for optical viewing. For SMENA heads on MP1SM and MP1LC. CCI03o MA001 Copyright NT-MDT,

67 SPM related products and accessories Light sources LS004 Cold light source with one-armed flexible light guide (Schott, Germany, KL1500, 120V). Only for CCD15TR, CCD15TRo. LS005 Cold light source with one-armed flexible light guide (Schott, Germany, KL1500, 230V). Only for CCD15TR, CCD15TRo. LS004, LS005 Stands TR003 Special stand with tiltable head for optical viewing system CCD03, CCD03o and Simple Focusing Arm SD-STB3 (Olympus). TR005 Special stand for optical viewing system CCD03o. Requires DBM05 TR006 Special stand for optical viewing system CCD03o. Requires MOD-NT01. For Solver HV. TR003 TR Copyright NT-MDT, 2005

68 Lens OB004 Auxiliary lens for CCD03o with Solver HV. OB006 Objective 10Х for SF005PRO and CCD03o. Monitors OB004 SPM related products and accessories CCBM1 Color LCD monitor 15": Ganz ZM-CL215NP (including Desktop stand Ganz ZMA-CL2DS). S-Video "Y" bisect a signal for a videocard. Video to VGA the converter of an analog signal in a signal for VGA the monitor, (two entrance signals VGA and Svideo, with an opportunity of switching between them) MNR01 LCD monitor 19'' for PC workstation. OB006 CCBM1 MNR01 Copyright NT-MDT,

69 SPM related products and accessories Laser modules LM001 Laser Module: Argon Ion Laser (Melles Griot) 488nm, 50mW, Coupling unit (Melles Griot 17AMB003MD/K): X-Y-Z positioners, V-groove fiber holder, positioning accuracy 1 µm, coupling 40X objective: W.D.=0.4mm. Fiber Delivery System KineFlex, optical stage for coupling unit and fiber collimator. LM002 LM001 Laser module: pumped solid state laser unit 532 nm, 3mW Coupling unit (Melles Griot 17AMB003MD/K): X-Y-Z positioners, V-groove fiber holder, positioning accuracy 1 µm, coupling 40X objective: W.D.=0.4mm, optical stage. LM003 He-CD Laser (PO "Plasma") 442 nm, 55mW, coupling unit (Melles Griot 17AMB003MD/K): X-Y-Z positioners, V-groove fiber holder, positioning accuracy 1 um, coupling 40X objective: W.D.=0.4mm, optical stage. Fiber Delivery System Kine Flex, optical for coupling unit and fiber collimator. LM001o Laser Module optical adapter. Argon Ion Laser (Melles Griot) to be supplied by the customer Coupling unit (Melles Griot 17AMB003MD/K): X-Y-Z positioners, V-groove fiber holder, positioning accuracy 1 µm, coupling 40X objective: W.D.=0.4mm. Fiber Delivery System KineFlex, optical stage for coupling unit and fiber collimator. Only for Argon laser. LM002 LM001o Spectrometers SM001 Spectrometer SL USB (Solar TII), wavelength range: 475 to 935 nm, F/number 4.9, focal Length 40mm, grating size: 12x10mm, grooves /mm=600, blazing wavelength: 650 nm, reciprocal linear dispersion (average) nm/mm=33.53, wavelength resolution 1.5nm, focal plane mm 13.76x0,2. Active pixel area, mm 29.2x0.2, Active pixel quantity 1720, pixel size mm: 0.008x0.2, entrance slit mm: 0.025x Copyright NT-MDT, 2005

70 PMT modules PM001 PMT, Hamamatsu (H ), spectral response nm, sensitivity at 420 nm 3*1010 V/W, built-in high voltage power supply, built-in current voltage conversion amplifier (1*106 V/A), frequency band width 20kHz, optical adapter and shutter for Olympus optical port. PM002 PM001 SPM related products and accessories PMT, Hamamatsu (H5783/P), spectral response nm, sensitivity at 420 nm 3*1010 V/W, built-in high voltage power supply, photon counting system PMS 300 (Becker&Hickle), optical adapter and shutter for Olympus optical port. PM003 PMT, Hamamatsu (H ), spectral response nm, sensitivity at 420 nm 3*1010 V/W, built-in high voltage power supply, built in current voltage conversion amplifier (1*106 V/A), frequency band width 20kHz, optical adapter and shutter for Biolam-P optical port. OB007 Reflection mode modules OB007 Optical unit for Reflection mode (special objective N/A=0.45; W.D.=30mm), built-in PMT Hamamatsu module H Copyright NT-MDT,

71 SPM related products and accessories Electronics BL022MTM SPM Controller. Power input V, 50Hz/60Hz. DSP board. Tower box. SPM Controller self-diagnostic board. With extension cables for SFC050LPRO, SFC050PRO BL022MRM Laboratory rack 19" for SPM Controllers and SPM control workstations. Power input V, 50Hz/60Hz. DSP board. Laboratory rack 19". SPM Controller self-diagnostic board. With extension cables for SFC050LPRO, SFC050PRO BL022MR Laboratory rack 19" for SPM Controllers and SPM control workstations. SPM Controller. Power input V, 50Hz/60Hz. Tower box. DSP board. SPM Controller self-diagnostic board (all models except for BL022LMT, BL022LT). BL022MTM BL022MT Laboratory rack 19" for SPM Controllers and SPM control workstations. SPM Controller. Power input V, 50Hz/60Hz. Tower box. DSP board. SPM Controller self-diagnostic board (all models except for BL022LMT, BL022LT). BL022LMT SPM Controller. Translation and rotary stages controller. Power input V or V, 50Hz/60Hz. Tower box. DSP board. SPM Controller self-diagnostic board (for BL022LMT, BL022LT). BL122SMT BL022MT, BL022MRM, BL022MR SPM Controller. Closed-loop stage controller. Power input V or V, 50Hz/60Hz. Tower box. DSP board. Board for strain gauge sensors. SPM Controller self-diagnostic board (all models except for BL022LMT, BL022LT). BL022LMT, BL122SMT 70 Copyright NT-MDT, 2005

72 Electronics BL0LGM External motorized approach leg controller. BL0XYZ Controller of X,Y,Z closed-loop equivalent scanner. BTC01 Thermo controller module for MP4LCPRO, SU005 BL0LGM SPM related products and accessories BL0XYZR Controller for X,Y,Z closed-loop equivalent scanner. For Laboratory rack 19". For BL022MNR. BL0XYZ BTC01 BL0XYZR Copyright NT-MDT,

73 SPM related products and accessories Interface cards IN004 PCMCIA interface board with cable for connecting SPM controller with Notebook (length 0.5 5m). IN005 PCI interface board with cable for connecting SPM controller with PC (length 0.5 5m). IN004 Workstations WSA01 SPM control Workstation: Scientific Mode data acquisition and image processing software for IBM compatible workstation (Windows 98/XP compatible software). Operator Mode data acquisition and image processing software for IBM compatible workstation (Windows 98/XP version). Pentium-4, 2400 MHz, RAM 1000MB, HDD 80Gb, DVD-RW. REMARK: Due to the dynamic nature of the computer industry, specifications are subject to change without notice. Monitor to be supplied by a local distributor/customer to comply with NTI requirements. WSA01R SPM control Workstation for Laboratory rack 19". Scientific Mode data acquisition and image processing software for IBM compatible workstation (Windows 98/XP compatible software). Operator Mode data acquisition and image processing software for IBM compatible workstation (Windows 98/XP version). Pentium-4, 2400 MHz, RAM 1000MB, HDD 80Gb, DVD-RW. REMARK: Due to the dynamic nature of the computer industry, specifications are subject to change without notice. Monitor to be supplied by a local distributor/customer to comply with NTI requirements. IN005 WSA01 WSA01R 72 Copyright NT-MDT, 2005

74 Software SWD01 Data acquisition and image processing software for IBM compatible workstation (Windows 95/98/XP compatible software). SWD02 Data acquisition and image processing software for IBM compatible workstation (Windows XP version). CE003 SPM related products and accessories SWD05 DNA-calc is comfortable specialized software which is intended for semi-automatical measurements of the length of linear objects such as DNA threads on AFM images, which are transformed in one of the graphical formats bmp, pcx, tiff. SWD07 FemtoScan image processing software. IC001 Cables CE002 Extension cables. (1) "HEAD" between head and SPM controller, (1) "SCANNER" between scanner and SPM controller, 2m length. CE003 Extension cord for SC103, SC110, SC150. For Solver MFM. IC001 Extra length of interface cable for connecting SPM controller with PC. Up to 300m length. Copyright NT-MDT,

75 SPM related products and accessories Toolkits SU001 Set of 10 substrates of polycrystalline sapphire. SU002 Substrate of polycrystalline sapphire with holder for samples up to 40x40mm. SU007 SU001 Set of 10 substrates of polycrystalline sapphire for SU013, SU003, SU005, SU023. SU008 Set of 10 substrates of polycrystalline sapphire for Liquid cell AU028. SU011 Sample holder for small samples for SCTP0 stage. SU015 Universal sample holder with contact spring for STM and Spreading Resistance Imaging modes. SU002 SU007 SU008 SU011 SU Copyright NT-MDT, 2005

76 Other instrumentation lines Probe Nano Laboratory Probe Nano Laboratory NTEGRA is a new class of analytical instrumentation being the natural result of the AFM evolution into a versatile measuring complex used for a wide range of applications in the nanotechnology field. It opens a new era of scanning probe instrumentation linking a top of the range SPM to: perfect optics (working close to the diffraction limit) complex spectral analysis (including SERS and TERS operations) tomography techniques (for spatial 3D reconstruction of biological and polymer samples) combinatorial material research The NTEGRA key feature is that all power of different analytical methods can be applied to one sample of interest and all hardware (SPM, Raman spectrometers, ultramicrotomes etc.) is integrated within one system by means of the special technical design solutions and universal software package. Thus one operator can perform complex and sometimes very sophisticated experiments obtaining the information package previously available only with the efforts of a large laboratory or even several different labs. Probe Nano Factory Richard Feynman, the great American physicist of the past century, predicted the rise of nanotechnology as far back as in "The principles of physics," he said, "do not speak against the possibility of maneuvering things atom by atom." And now we are not discussing whether it is possible or not, but what kind of a technology should be applied to do it. The technological breakthrough achieved in 21 century unequivocally points the vector of new technique development towards micro- and nano-scale machines. It becomes evident that there should be specialized factories for parts of such machines to be made and processed. Our comprehension of the problem guides us to creation and serial manufacturing of industrial systems for these purposes. Our policy is not to supply all possible processing devices ("one stop shop") like others do, but to create brand new devices providing the environment and all tools to process the nano-scale parts on micro-scale conveyor. The NanoFab concept includes different methods of surface modifications (selective etching, focused ion or electron beam directed material deposition, nanoindentation etc.) combined with complex nano-scale surface analysis (such as SEM, STM, AFM, MFM etc). All these tools and facilities are integrated within high vacuum chambers by a universal sample transporting system (including connection with MBE systems), which provides sequential positioning of the sample to be processed by a method of choice. That is something like assembly belt line common on the macro-world factories. The difference is that the whole cycle of sophisticate micro-device manufacturing including each part processing and quality control can be located within one room, and several production lines can be operated automatically from one central computer interface. Copyright NT-MDT,

77 Short glossary AC Contact (AFM) techniques AFM modes when the probe is enforced to oscillations being all the time in contact with the surface. In this case the surface area in the closest proximity of the probe becomes oscillating as well. AC Magnetic Force Microscopy (AFM mode) Two-pass AFM technique when magnetic probe oscillation parameters change due to the sample-probe magnetic interactions forming an image contrast. Adhesion Force Imaging A type of spectroscopybased imaging when force-distance curves are determined for each point of the surface. In this case the surface adhesion can be mapped since it causes substantial differences between f-d curves when approaching and retracting the probe. 76 Copyright NT-MDT, 2005

78 Atomic Force Acoustic Microcopy (AFAM) AFAM resonance spectroscopy Atomic Force Microcopy (AFM) AC Contact AFM mode when the sample is enforced to out-of-plane vibrations while the probe is in contact with the surface. Vibration frequency is adjusted to be close to the resonance. Changes of cantilever oscillation amplitude caused by differences in local stiffness provide an image contrast. AC Contact AFM mode when the sample is enforced to out-of-plane vibrations while the probe is in contact with the surface. During scanning the resonance frequency (or first mode frequenies) of supported cantilever vibration is registered in each point. It allows calculation and nano-scale mapping of the sample Young modulus. A type of scanning probe microscopy based on registration of atomic forces that act on a sharp tip (sometimes specially coated) in very close proximity to the surface. Short glossary AFM lithography - dynamic plowing A type of nano-scale surface modifications when the AFM probe is used to pick the surface in semicontact mode. AFM lithography - scratching A type of nano-scale surface modifications when the AFM probe is used to scratch the surface in contact mode. AFM oxidation lithography A type of nano-scale surface modifications when the current-conducting AFM tip is used for local electro-chemical surface oxidation. Often the tip-formed oxide protrudes from the surface thus new surface topography can be engineered. Copyright NT-MDT,

79 Short glossary Amplitude-distance curves A plot of probe oscillation amplitude variation when the probe is approached to or retracted from the sample surface. Constant Current STM mode Constant Force AFM mode Constant Height AFM mode STM mode when the feed-back mechanism makes the tunnel current constant between the probe and the surface; feed-back signal value in this case is used to image the surface topography. AFM mode when the system drives the probe over the surface so that it's deflection does not change (thus the force applied to the surface remains constant); feed-back signal value is used to image the surface topography. AFM mode when the feed-back mechanism is disconnected and the scanner drives the probe over the surface at constant z-signal; cantilever deflection is used to monitor the surface topography. Constant Height STM mode STM mode when the feed-back mechanism is disconnected and the scanner drives the probe over the surface at constant z-signal; the value of tunnel current is used to image the surface topography. 78 Copyright NT-MDT, 2005

80 Contact Electric Force Microscopy (AFM mode) Contact Error AFM mode AC Contact AFM mode when AC voltage is applied to the probe while scanning. Changes in the amplitude of cantilever oscillations caused by first harmonic of the capacitive force form an image that reflects the distribution of surface potential. Derivative of the Constant Force AFM mode. When surface relief changes are too abrupt, short-term differences occur between the probe signal, which is in fact registered, and the set-point signal. These differences are used to form an image contrast in this technique. Short glossary DC Contact (AFM) techniques AFM modes when the probe moves over the surface in a constant contact with it without any oscillations. DC Magnetic Force Microscopy (AFM mode) Two-pass AFM technique when changes in deflection of the cantilever caused by the any tip-sample magnetic interactions form an image contrast. Dissipation Force Microscopy (AFM mode) Two-pass AFM technique when any tip-sample interactions cause damping of the probe oscillations. It is quantified and used to build an image. Copyright NT-MDT,

81 Short glossary Electric Force Microscopy (AFM mode) Force-distance curves Two-pass AFM technique when the oscillating probe follows the pre-determined surface landscape in a non-contact manner; the surface potential and associated charges can modulate oscillation parameters (amplitude and phase), and their differences form an image contrast. A plot of distance dependence on the forces that act to the tip in the close proximity to the surface. These forces are recorded when the tip is approached to the surface or retracted from it. Force modulation AFM mode AC Contact AFM mode when the oscillating tip pushes down a local surface area to a depth depending on the local stiffness of the sample. Frequency modulation AFM mode Non-contact AFM technique when the frequency of the probe oscillation influenced by non-contact tipsample interaction serves as the feedback parameter. Kelvin Probe Microscopy (AFM mode) Two-pass AFM technique when the DC and AC potentials are applied to the tip oscillating in non-contact mode, the DC potential is adjusted to compensate the surface potential nulling the amplitude of the probe oscillation. Recording of the nulling potential applied for each point presents the map of surface potential distribution. 80 Copyright NT-MDT, 2005

82 Lateral Force Imaging AFM mode DC Contact AFM technique when the cantilever torsion is detected during the scanning. Scanning is performed across the cantilever long axis. Short glossary Non-contact AFM techniques AFM techniques with the probe oscillating close to the surface without touching it. Non-contact AFM mode Phase-distance curves Non-contact AFM mode when the probe oscillation amplitude influenced by non-contact tip-sample interactions remains constant; the feed-back signal forms an image contrast reflecting surface topography. A plot of the probe oscillation phase variation when the probe is approached to or retracted from the sample surface. Phase imaging AFM mode Semicontact AFM technique when a phase shift of the probe oscillation is used to form an image contrast; the phase changes for surface areas of different stiffness, adhesion, and so on. Copyright NT-MDT,

83 Short glossary Scanning Capacitance Microscopy (noncontact AFM mode) Scanning Capacitance Microscopy (contact AFM mode) Shear-force microscopy SNOM SNOM lithography Two-pass AFM technique when AC potential is applied to the probe oscillation is used to form an image contrast; the phase changes for surface and the surface distribution of the tip-sample capacitance derivative can be mapped by the oscillating probe following pre-determined surface landscape in a non-contact mode; second harmonic of cantilever oscillations amplitude variations is detected. A metallic or metallized AFM tip is used for imaging the wafer topography in conventional contact mode. The tip also serves as an electrode for simultaneous measuring of the metal-silicon-oxide-semiconductor (MOS) capacitance. A type of scanning probe microscopy when laterally oscillating probe (optical fiber) undergoes crucial changes in oscillation amplitude in the close proximity to the sample surface. When performing the feed-back control to maintain the oscillation amplitude constant the feed-back signal can be used to image the surface topography. Shear-force technology is the most common way to bring the optical fiber very close to the surface to perform the SNOM measurements. A type of scanning probe microscopy based on the registration of a negligible light passed trough a sub-wave diaphragm in a close proximity to the object (at the distance of several nanometers where near-field effects occur); allows nano-scale object optical investigation overcoming the optics diffraction limits. A type of nano-scale surface modifications when the laser-emitted light is applied to photosensitive surface layers by the SNOM technology. SNOM luminescence mode Scanning Near-field Optical Microscopy mode when the light brought by the optical fiber excites the luminescence of the sample; emitted luminescence photons are then gathered and detected. Scanning Near-field Optical Microscopy mode when the light brought by the optical fiber is reflected by non-transparent sample and is then gathered and detected. 82 Copyright NT-MDT, 2005

84 SNOM reflection mode Scanning Near-field Optical Microscopy mode when the light brought by the optical fiber goes through the transparent sample and is then gathered and detected. Short glossary SNOM transmission mode Scanning Near-field Optical Microscopy mode when the light brought by the optical fiber goes through the transparent sample and is then gathered and detected. Scanning Probe Microscopy (SPM) Scanning Tunneling Microscopy (STM) STM lithography Group of modern microscopy methods the sample surface properties are studied by point by point scanning. A type of scanning probe microscopy based on registration of tunneling current that occurs between a very sharp conductive tip and an object in a close proximity of the object surface. A type of nano-scale surface modifications when the STM probe is used for surface modification. The common way is to burn out the sample with high-current pulses locally. STM spectroscopy Different methods in the STM (like Barrier Height imaging, Density of States imaging, I(z) Spectroscopy, or I(V) Spectroscopy) used to characterize the electron properties of a surface or to make contrast images based on differences in these properties. Copyright NT-MDT,

85 Short glossary Two-pass (many-pass) AFM techniques Semicontact AFM mode (Intermittent mode) Methods for complex AFM characterization of object. The first pass is performed in contact or semicontact mode to determine the surface topology. The subsequent pass(es) obtain additional information, for example, electrical, magnet or some other sample properties. Usually second pass scanning is performed in a non-contact mode when the probe follows the predetermined surface topography but moves a bit higher without touching the sample. Semicontact AFM technique when the probe oscillates above the surface contacting it intermittently; the difference in oscillation frequency creates an image contrast. Semicontact error AFM mode Semicontact techniques Semicontact AFM imaging technique based on a feed-back "error" signal: when surface topography changes are too abrupt, short-term differences occur between the probe signal, which is in fact registered, and the set-point signal. This difference is used to form an image contrast. AFM techniques with the oscillating tip contacting ("touching") the surface periodically in the extreme points of its trajectory. Spreading Resistance Imaging DC Contact AFM technique when bias voltage is applied to the conducting tip; resulting current through the sample is measured. 84 Copyright NT-MDT, 2005

86 Accessories Contents AFM "Golden" Silicon Probes AFM "Whisker Type" Tips Super Sharp DLC Tips SNOM probes SNG01 test grating Test samples HOPG for SPM applications DNA test sample STEPP test sample TGS1 grating set TDG01 diffraction gratings TGT1 test grating TGG1 test grating TGX1 test grating Our Internet shop is opened! You are welcome to buy any accessories at Exclusively from NT-MDT - famous grating TGT1 for tip characterization, super sharp DLC tips, and PTB certified gratings. Also a broad choice of probes, calibration standards and test samples is available. Copyright NT-MDT,

87 AFM "Golden" Silicon Probes Accessories Standard chip size: 1.6x3.6x0.4 mm. Compatible with the most commercial SPM devices. High reflective chemically stable Au back side coating (reflectivity is 3 times better in comparison with uncoated cantilevers). Typical tip curvature radius: 10 nm. Tip height: µm. Available for dc and ac including resonant modes (contact+semicontact+noncontact). Rectangular and Triangular cantilevers. Calibrated SEM photo for each probe tip with guaranteed curvature radius 10nm or less for probe series with letter "S" in the series name. Silicon is boron doped up to high conductivity level (5x10 20 cm -3 ) to avoid electrostatic charges. Available with conductive TiN, W2C, Pt, Au and magnetic Co coatings 30 nm SEM images of Golden silicon cantilevers Packaged in GelPak boxes. (GelPak is a registered trade mark of Vichem Corporation) GOLDEN Silicon probes NSG20 series GOLDEN Silicon probes NSG01, NSG10, CSG01, CSG10, CSG10 series 86 Copyright NT-MDT, 2005

88 AFM "Golden" Silicon Probes Chip thickness Reflective side coating Aspect ratio Tip cone angle Tip curvature radius 0.4 mm Au 3:1 22 typical 10nm Accessories Available probe series Noncontact NSG11, NGSG11S NSG10, NSG10S NSG01, NSG01S NSG20, NSG20S Contact CSG11, CSG11 CSG10, CSG10S CSG01, CSG01S Cantilever number the probe series has (see the spring specification in the table below) Each probe has two cantilevers Each probe has one cantilevers Probe series NSG11, NSG11S CSG11, CSG11S NSG10, NSG10S CSG10, CSG10S NSG01, NSG01S CSG01, CSG01S NSG20, NSG20S Cantilever A B A B A A B B A Cantilever length, L±5 µm Cantilever width, W±3 µm min Cantilever thickness, µm typical max Resonant frequency, khz min typical max Force constant, N/m min typical max Copyright NT-MDT,

89 AFM "Whisker Type" Tips Accessories Whisker Type" tips go deeper inside narrow gaps when the standard probes fail to measure the bottom and to control near vertical sidewalls: Fig. a: SPM image obtained by Whisker type tips. Fig. b: SPM image obtained by usual silicon cantilever. EBD material is hydrophobic, hard and mechanically stable. We offer programmable control of the "Whisker Type" tip to make the tip truly perpendicular to the surface you are measuring (since each different model SPM cantilever holder varies in its angle of inclination, the angle at which it holds the tip). Any angle of inclination α you need to match your SPM holder specification can be produced. Just specify the angle of inclination you want (Fig.c). SEM image of EBD tip, specially designed to measure samples with near vertical sidewalls a b c α α 300 nm 300 nm 88 Copyright NT-MDT, 2005

90 AFM "Whisker Type" Tips EBD Tip Specification Material Aspect ratio Angle ϕ Curvature radius of: uncoated tip magnetic Co coated tip Standart angle of inclianation α* Carbyne (carbon modification) better than 10:1 10 typical 10 nm typical 20 nm 20 ± 1 ; 10 ± 1 Accessories Probe Specification Chip thickness H Reflective side coating Chip has one straight cantilever 0,4mm Au CSC05 for contact mode NSC05 for noncontact mode MSC05 for magnetic force microscopy Cantilever length, L±5 µm Cantilever width, W±3 µm Cantilever thickness, µm min typical max Resonant frequency, khz min typical max Force constant, N/m min typical max EBD tip length**, µm min typical max CONTACT NONCONTACT MAGNETIC * any other inclination angle is available ** other Whisker length can be considered Copyright NT-MDT,

91 Super sharp Diamond-Like Carbon (DLC) tips Accessories Super sharp diamond-like carbon (DLC) tips with typical curvature radius 1nm are extremely useful for obtaining high resolution on objects with sizes of several nanometers. DLC tips have very long lifetime due to the high material durability. DLC tips can be grown on any standard probe series. Each silicon tip is controlled by SEM after the growing process. It allows selection the probe with the DLC tip that length is bigger then others for 20nm or more. In other words one of the DLC tips has a working length not less than 20nm. DLC tip specification: Material diamond-like carbon Curvature radius 1nm. Working length >20nm Probe Specification: Chip size 3,6x1,6x0,4mm 3 Reflective side coating Au Chip has one rectangular cantilever SEM image of the grown DLC tips on the probe NSG01 series, specially dulled for better growth process Specification Probe series Cantilever length, L±5µm Cantilever width, W±3µm NSG01* Cantilever thickness, µm Resonant frequency, khz Force constant, N/m min typical max * DLC tips can be grown on any other probe series by request 90 Copyright NT-MDT, 2005

92 SNOM probes Probes for a Scanning Near Field optical Microscope with and without glued tuning forks. Accessories Probe specification Material Fiber length Tip diameter uncoated by Al (tip aperture) Curvature radius Angle of fiber Maximum optical input power Maximum optical output power single mode optical fiber coated with aluminum 2 meters nm nm 7-13 degrees 0.5 mw 5 µw Characteristic Transmitted wave length, nm Optical fiber diameter, µm Optical efficiency for 100 nm aperture Optical efficiency for 50 nm aperture I type x x10-4 II type x x10-5 III type x x10-4 SNG01 Test Grating Standard test sample for Scanning Near Field Optical Microscope. Grating specification Substrate Substrate size Rhomb material Active area quartz (0,5 mm thickness) 10x10mm vanadium central diameter 3 mm array Transmission coefficient through metal coating (rhomb) < 20% Reflection coefficient from metal coating (rhomb) > 40% R curvature of rhomb < 50 nm Copyright NT-MDT,

93 Test samples Accessories HOPG for SPM applications Highly Oriented Pyrolytic Graphite is a material that consists of many atomic carbon layers highly oriented among each other. This property makes HOPG the excellent tool for STM calibration. The parallelism of atomic layers is characterized by "mosaic spread angle". The smaller this angle the higher the HOPG quality is. Highly Oriented Pyrolytic Graphite HOPG Specification HOPG ZYA Quality typical mosaic spread: 0.4 degree: Item GRAS/1.5 GRAS/1.2 Size, mm 2 10x10 10x10 Nominal thickness, mm ±0.2 Available size up to 12x12mm 2 HOPG ZYB Quality typical mosaic spread: 0.8 degree: Item GRBS/2.0 GRBS/1.7 GRBS/1.2 Size, mm 2 10x10 10x10 10x10 Nominal thickness, mm ± ±0.2 Available size up to 12x12mm 2 HOPG ZYH Quality typical mosaic spread: 3.5 degree: Item GRHS/2.0 GRHS/1.7 GRHS/1.2 Size, mm 2 10x10 10x10 10x10 Nominal thickness, mm ± ±0.2 Available size up to 45x45mm 2 92 Copyright NT-MDT, 2005

94 Test samples DNA test sample DNA01 is Plasmid pgem7zf+ (Promega), which is linearized with the SmaI endonuclease. Linear DNA molecules (3000 b. p.) are deposited at the freshly cleaved mica surface. Molecules are uniformly distributed over the surface with the molecular density molec/m2. The typical DNA length is 1009 nm. Recommended humidity for obtaining a good image is 3-5%. Accessories DNA01 is a long-life, stable and indestructible sample for AFM investigation in air Applications Initial work with your AFM An example on how to prepare your own DNA samples Estimation of cantilever tip curvature Z-resolution test STEPP test sample STEPP The Silicon Test Echeloned Pattern for AFM is designed on the base of silicon (111) surface with verified distribution of monoatomic steps as main calibrating units for the complex control of AFM set up: Height calibrating in angstrom and single nanometer intervals on the monoatomic steps; Using the STEPP as the substrate for investigations of bio-objects, particulate matter and other; More precision diagnostic of nanoobjects. STEPP AFM image STEPP Specification Chip size 1x4x0.3 mm 3 Average interstep distance Misorientation of surface from the (111) plate Single monoatomic step height Average roughness of the area without monoatomic steps (terrace) ~ µm ~ nm 0.06 nm Copyright NT-MDT,

95 Test samples TGQ1 calibration grating Accessories Test grating TGQ1 is intended for: simultaneous calibration in X, Y and Z directions; lateral calibration of SPM scanners; detection of lateral non-linearity, hysteresis, creep and cross-coupling effects. TGQ1 AFM image Grating description Structure Pattern types Period Height Square side size: Chip size Effective area the grating is formed on Si wafer top surface 3-Dimensional array of small squares 3.0±0,05µm 19,5nm ±1,5 nm 1,5±0,15µm 5x5x0,5 mm central square 3x3 mm TGS1 Grating set Calibration grating set TGS1 is intended for Z-axis calibration of scanning probe microscopes and nonlinearity measurements. Grating set contains 3 grating TGZ1, TGZ2, TGZ3 with different step heights. 3 µm SEM photo of TDZ3 grating Grating description Structure Si wafer the grating is formed on the layer of SiO2 Pattern types Step height Period Chip size Effective area 1- Dimensional (in Z-axis direction) TGZ1 19±1nm TGZ2 104±1,5nm TGZ3 540±2nm 3±0,1µm 5x5x0,5mm central square 3x3mm 94 Copyright NT-MDT, 2005

96 Test samples TDG01 diffraction gratings Diffraction grating TDG01 is intended for submicron calibration of scanning probe microscope in the X or Y direction Accessories Grating description Structure Pattern type Pattern height Geometry Period Accuracy Size Effective area Diffraction grating TDG01 glass wafer the grating is formed on the layer of chalcagenid glass the grating top surface is aluminium 1- Dimensional (in the X or Y direction) > 55 nm provides good image contrast parallel ridges 278 nm (3600 periods/mm) ±1nm diameter 12,5 mm, thickness 2,5 mm central diameter 9 mm TGT1 test grating Test grating TGT1 is intended for: for 3-D visualization of the scanning tip; determination of tip sharpness parameters (aspect ratio and curvature radius), tip degradation and contamination control. TGT1 SEM image Grating description Structure Pattern types Tip angle Tip curvature radius Period Diagonal period Chip size Effective area Height, h the grating is formed on Si wafer top surface array of sharp tips 30 degrees 10 nm 3 µm 2.12 µm 5x5x0.5 mm central square 2x2 mm µm Copyright NT-MDT,

97 Test samples TGG1 test grating Accessories Test grating TGG1 is intended for: SPM calibration in X or Y axis; detection of lateral and vertical scanner nonlinearity; detection of angular distortion; tip characterization. TGG1 AFM image Grating description Structure Pattern types Edge angle Edge radius Period Chip size Effective area the grating is formed on Si wafer top surface 1- D array of triangular steps (in X or Y direction) having precise linear and angular sizes 70 degrees 10 nm 3±0.1 µm 5x5x0.5 mm central square 3x3 mm TGX1 test grating Test grating TGX1 is intended for: lateral calibration of SPM scanners; detection of lateral non-linearity, hysteresis, creep, and cross-coupling effects; determination of the tip aspect ratio Grating description Structure Pattern types Period Edge curvature radius Chip size Effective area Height the grating is formed on Si wafer top surface chessboard-like array of square pillars with sharp undercut edges 3 µm less than 10 nm 5x5x0.5 mm central square 3x3 mm 0.6 µm* * the dimensions marked * are given for information only 96 Copyright NT-MDT, 2005

98