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1 NanoFocus Inc. Next Generation Scanning Probe Technology Tel : Fax:

2 Albatross SPM is Multi functional research grade system Flexure scanner and closed-loop scanning Acceptable large samples Easy to add environmental aperture Easy to exchange sample, probe and positioning Liquid operation and temperature control of sample Confocal microscope, raman and PL spectroscopy Powerful nanolithography tools NanoFocus Albatross SPM covers the full range scanning probe microscopy techniques to investigate the surface properties like as topography, electronic, magnetic and optical characteristics from nanoscale to several tens of micron, especially for Bio Technology. The state-of-the-art DSP-based fast digital controller provides not only much easy and flexible operational interface but also sufficient high speed & resolution imaging solution. Also, our system provides very versatile Ethernet-based remote control of the SPM instrument. Advance nanolithography tool supports the very convenient interface as well as various probe-based writing techniques.

3 Hardware System Mechanical Head Type : Laser beam bounce Easy/quick laser alignment(linear translation of laser point and PSPD for all axis). Easy to exchange probe and sample Easy/precise movement of the probe Confocal Microscope Module Inverted optical microscope and optical measurement setup (Nikon TE-2000U inverted optical microscope) Low-noise photon counting module(apd and counter electronic module) 40mW, multi-line(457 nm~ 514 nm) laser Easy fiber alignment/laser focusing system Nano raman & photo luminescence spectroscopy and imaging High resolution CCD for inverted optical microscope imaging Active anti-vibration table Frequency : 0.7Hz ~ 1000Hz Static compliance - vertical : approx.12um/n - horizontal : approx.30~40um/n Load range : 0~150 kg High performance Digital Controller Built-in the most fast digital signal processor in the world market Fast and high resolution imaging are realized by the high performance DSP technology, 16bit AD, 24-bit DA Converter The first SPM running in the internet(remote operation/on wireless communication) Synchronous integrated photon counting electronics

4 Image Gallery 3.0um 0.60um Standard Sample /Noncontact Mode PZT film/topography Au Nanoparticle/Topography (200 nm X 200 nm) 10um 0.20um 1.0um TGS/EFM Mode PZT film/efm Mode (Before Poling) PZT film/efm Mode (After Poling) 1.0um 2.0um LSMO thin film/mfm Mode Hard disk data bits/mfm Mode Vector lithography 2.0um 2.0um Raster lithography/einstein Raster lithography/hahoe Mask Raster lithography/kim Yuna

5 Image Gallery 5.0um TGS/Topography TGS/Topography TGS, Enhanced gray color /Topography 5.8um 5.8um PMN-PT nanowire /Topography(Noncontact mode) PMN-PT nanowire/confocal PMN-PT nanowire /Photo luminescence 1.8um 8.0um 6.0um Au Nano Particle /Confocal(Size = 50 nm) 4GBit DRAM/ Confocal Bovine Serum Albumin Protein Pattern 1.2um 1.0um Shewanella bacterium /Contact mode DNA with atomic step /DFM mode Tobacco Virus/DFM Mode

6 Spectroscopy Tools Spectroscopy tool is very powerful and valuable function to measure the physical characteristics at the specific point. The Albatross gives you various spectroscopy methods such as force vs. distance, current vs. voltage, and polarization vs. electric filed measurement. The closed loop scanner minimizes positioning error due to drift, creep, nonlinearity and hysteresis of the piezoelectric scanner while the spectroscopy is carried out. F-D spectroscopy Measure inter-atomic force, vibration amplitude and phase of the probe with as a function of distance from surface. I-V Spectroscopy Measure current(i-v) and differential conductance (di/dv) between probe and sample. D-E Spectroscopy Measure polarization versus applied electric filed curve on the ferroelectric materials. User Spectroscopy mode User can freely choose driving and signal to measure with any combination. Au ZnO Wire I V

7 Probe-Based Nanolithography Nanolithography tool gives users a chance to modify the sample surface and to make nanostructures. Vector and raster drawing method, various exposure source can be used as samples and applications. In the vector type lithography mode, the probe just moves over sample surface where the pattern is transferred. In raster scan lithography mode, the probe scans entire surface where patterns are drawn. The Albatross software and hardware support not only both drawing methods but also various exposing source, like as tip bias, sample bias, set-point, z-piezo position or any combinations of those. Users can easily created their own pattern by using pattern editor on Albatross software or others painting tools. In the vector mode, user can freely add or edit objects such as a point, line, square, ellipse, circle, and poly line etc. Any photos can be handled as well as many painting job can be done in the raster mode. Our software gives easy and powerful platform you to work the nanolithography. Vector Lithography Software Raster Lithography Software 2.4um 1.4um Domain Reversal on PZT/Vector Scratching poly carbonate surface/ Vector Oxidation on Ti thin film/raster Nano-indentation on polycarbonate/raster Application Fields Oxidation of Si or metal surface Low-voltage electron beam lithography with precise current control Thermal mechanical writing on the polymer sample Mechanical modification/nano-indentation Modify electrical information on the ferroelectric domain reversal Data storage Bio material printing Nano manipulation 2.8um Nano-indentation Lithography

8 Albatross Specification Mechanical Head CCD Optical Microscope XYZ 3D Scanner - Type : Single module parallel-kinematics flexure stage with closed loop control - Range : 100 μm x 100 μm for XY, 12 μm for Z - Resolution : 0.2 nm for XY, 0.05nm for Z Precision Positioning Stage - Tip XY movement : ± 2mm - Resolution :~ 5 μm -Sample XY movement : ± 5mm - Resolution : 5μm - Sample size : 40 mm x 40 mm Z-stage -Travel: 30 mm - Resolution: < 0.05um High resolution optical microscope for probe & sample view On-axis optical view with max.1000x magnification Max field of view : 1 mm x 1 mm(depends on zoom) Resolution : 1 um Working distance : 35 mm Precise penning view with a manual micrometer stage Manual view positioning : ±10 mm in XY Manual fine coarse & fine focus stage Inverted Optical Microscope 20X Objective NA = MPixel CCD(High Resolution/Sensitivity CCD) High performance Digital Controller Fast(300MHz) floating point DSP 1800 MFLOPS 14 Ch 16 Bit, 1Mbps sampling ADC 4 Ch 24 Bit DAC and 8 Ch 12 Bit DAC(±10V output) Digital lock-in module for DFM mode - Frequency : Dual-phase lock-in, 1KHz~1MHz - Phase resolution : Frequency resolution : 0.02Hz Analog signal access module - 10 channel 16 bit 1MPS ADC for user input signal(±10v) - 2 channel 12 bit DAC output for user signal(±10v) Two 32-bit digital counter for user application 3 Ch digital feedback for closed loop scanner 8 bit digital input and 24 bit digital output Ethernet communication Standard Application Mode Contact and Noncontact mode dynamic force microscopy(dfm) Lateral force microscopy(lfm) F-D Spectroscopy Advanced Mode Magnetic force microscopy(mfm) Force modulation microscopy(fmm) Phase imaging mode Nanolithography(Vector/Raster) mode Conductive mode(current imaging mode) I-V Spectroscopy Constant current lithography Electric force microscopy(efm) and KFM Liquid imaging mode

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